1 February 2003 Large surface profile measurement with instantaneous phase-shifting interferometry
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Optical Engineering, 42(2), (2003). doi:10.1117/1.1532331
Abstract
Surface profile measurement of smooth surfaces is a vital area in many of today's industries, especially in wafer fabrication. The increased need for high-speed, noncontact online measurement with high accuracy and repeatability is of great interest for practical purposes. In this work, a modification of Michelson interferometers in combination with instantaneous phase-shifting interferometry is proposed for high-speed large flat-surface profiling. Experiments are carried out on a patterned wafer surface. The results obtained using this system are compared with a commercial profiler system to demonstrate the validity of the principle.
N. R. Sivakumar, W. K. Hui, Krishnan Venkatakrishnan, B. K. A. Ngoi, "Large surface profile measurement with instantaneous phase-shifting interferometry," Optical Engineering 42(2), (1 February 2003). https://doi.org/10.1117/1.1532331
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