1 February 2003 Real-time photolithographic technique for fabrication of arbitrarily shaped microstructures
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A new photolithographic technique that combines the advantages of a programmable digital liquid crystal display (LCD) system and projection photolithography system to fabricate arbitrarily shaped microstructures using LCD panels as real-time masks is reported. Its principle and design method are explained. Based on a partial coherent imaging theory, the process to fabricate microaxicon arrays and zigzag gratings is simulated. The experiment has been set up using a color LCD as a real-time mask. Microaxicon arrays and zigzag gratings have been fabricated by a real-time photolithographic technique. The 3-D surface relief structures are made on panchromatic silver-halide sensitized gelatin (Kodak-131) with trypsinase etching. The pitch size of the zigzag grating is 46.26 μm, and the etching depth is 0.802 μm. The caliber of the axicon is 118.7 μm, and the etching depth is 1.332 μm.
© (2003) Society of Photo-Optical Instrumentation Engineers (SPIE)
Qinjun Peng, Qinjun Peng, Shijie Liu, Shijie Liu, Yongkang Guo, Yongkang Guo, Bo Chen, Bo Chen, Jinglei Du, Jinglei Du, Yangsu Zeng, Yangsu Zeng, Chongxi Zhou, Chongxi Zhou, Zheng Cui, Zheng Cui, } "Real-time photolithographic technique for fabrication of arbitrarily shaped microstructures," Optical Engineering 42(2), (1 February 2003). https://doi.org/10.1117/1.1531976 . Submission:

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