1 February 2003 Simulation of the fabrication infidelity of diffractive-optical elements by using halftone gray-scale masks
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Optical Engineering, 42(2), (2003). doi:10.1117/1.1532745
Abstract
A model is set up to simulate the fabrication infidelity of diffractive-optical elements using halftone gray-scale masks. The infidelity includes, for different spatial frequencies, variations in maximum exposure depth in photoresist, relative transition width between adjacent ramps, and nonlinearity. The attenuation of the modulation transfer function (MTF) of the fabrication system at a high spatial frequency is the main reason for all the fabrication infidelity. The component whose MTF attenuates most in the fabrication system is generally photoreduction.
J. S. Liu, M. J. Thomson, Mohammad R. Taghizadeh, "Simulation of the fabrication infidelity of diffractive-optical elements by using halftone gray-scale masks," Optical Engineering 42(2), (1 February 2003). http://dx.doi.org/10.1117/1.1532745
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KEYWORDS
Modulation transfer functions

Photoresist materials

Device simulation

Spatial frequencies

Halftones

Printing

Signal attenuation

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