1 February 2003 Simulation of the fabrication infidelity of diffractive-optical elements by using halftone gray-scale masks
Author Affiliations +
Abstract
A model is set up to simulate the fabrication infidelity of diffractive-optical elements using halftone gray-scale masks. The infidelity includes, for different spatial frequencies, variations in maximum exposure depth in photoresist, relative transition width between adjacent ramps, and nonlinearity. The attenuation of the modulation transfer function (MTF) of the fabrication system at a high spatial frequency is the main reason for all the fabrication infidelity. The component whose MTF attenuates most in the fabrication system is generally photoreduction.
© (2003) Society of Photo-Optical Instrumentation Engineers (SPIE)
J. S. Liu, J. S. Liu, M. J. Thomson, M. J. Thomson, Mohammad R. Taghizadeh, Mohammad R. Taghizadeh, "Simulation of the fabrication infidelity of diffractive-optical elements by using halftone gray-scale masks," Optical Engineering 42(2), (1 February 2003). https://doi.org/10.1117/1.1532745 . Submission:
JOURNAL ARTICLE
6 PAGES


SHARE
RELATED CONTENT

Analysis of imaging system performance capabilities
Proceedings of SPIE (June 09 2013)
Measurement of printer MTFs
Proceedings of SPIE (January 18 2009)
Moire suppression screening
Proceedings of SPIE (December 20 1999)
Converting color values using stochastic interpolation
Proceedings of SPIE (December 20 1999)

Back to Top