1 April 2003 Optical waveguide fabrication by combination of spin-on-glass and plasma-enhanced chemical vapor deposition for optoelectronic integration
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Abstract
Low-loss optical waveguides for optoelectronic integration were realized by the combination of spin-on-glass (SOG) and plasma-enhanced chemical vapor deposition (PECVD). Undercladdings of 20-μm thickness together with cores of 6-μm height and 8-μm width were formed on Si substrates by PECVD and reactive ion etching. Overcladdings were formed by a combination of SOG and PECVD SiO2 films. This method successfully filled narrow gaps between cores of optical circuits. The refractive index of overcladdings was adjusted by SOG curing and fluorine incorporation in PECVD SiO2 films. A buried-type optical waveguide formed by the combination of SOG and PECVD showed single-mode propagation. Propagation losses and polarization dependent losses at the 1.3-μm wavelength were measured to be 0.3 dB/cm and below 0.15 dB, respectively.
© (2003) Society of Photo-Optical Instrumentation Engineers (SPIE)
Tomiyuki Arakawa, Tomiyuki Arakawa, Tatsushi Hasegawa, Tatsushi Hasegawa, Masatoshi Kagawa, Masatoshi Kagawa, } "Optical waveguide fabrication by combination of spin-on-glass and plasma-enhanced chemical vapor deposition for optoelectronic integration," Optical Engineering 42(4), (1 April 2003). https://doi.org/10.1117/1.1558392 . Submission:
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