1 August 2004 Fabrication and characterization of ridge structures in LiNbO3 for optical components
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Abstract
We describe the fabrication and characterization of ridge structure on Z-cut LiNbO3 substrates. Titanium strip patterns are formed using conventional photolithography and are used as a mask. The unmasked portions are then proton exchanged. As proton-exchanged LiNbO3 have a much higher etch rate than bulk LiNbO3, these portions are etched away easily by a suitable etchant, leaving a ridge structure along the masked portion. Different characterizations have been done both before and after annealing the proton exchanged areas. These ridge structures can be used for making broadband modulators.
© (2004) Society of Photo-Optical Instrumentation Engineers (SPIE)
R. Chakraborty, R. Chakraborty, J. C. Biswas, J. C. Biswas, S. K. Lahiri, S. K. Lahiri, } "Fabrication and characterization of ridge structures in LiNbO3 for optical components," Optical Engineering 43(8), (1 August 2004). https://doi.org/10.1117/1.1758270 . Submission:
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