1 April 2005 Two-grating interferometer with sinusoidal phase modulation for surface profile measurement
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Optical Engineering, 44(4), 043601 (2005). doi:10.1117/1.1883083
Abstract
A two-grating interferometer for measurement of profiles of polished surfaces is proposed. The ±first-order beams diffracted by the first grating produce parallel fringes of about 50-µm spacing on an object surface. By using the second grating, we eliminate the parallel fringes and extract a phase distribution produced by the surface profile of the object. Moreover, the vibration of the second grating of a small size enables us to use the sinusoidal phase-modulating interferometry. Measurement resolution is higher than 0.3 µm at the equivalent wavelength of 35 µm.
Yande Xu, Osami Sasaki, Takamasa Suzuki, "Two-grating interferometer with sinusoidal phase modulation for surface profile measurement," Optical Engineering 44(4), 043601 (1 April 2005). http://dx.doi.org/10.1117/1.1883083
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KEYWORDS
Surface finishing

Interferometers

CCD image sensors

Polishing

Signal detection

Imaging systems

Interferometry

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