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1 May 2005 Optical micro-shadowgraph-based method for measuring micro-solderball height
Shihua Wang, Chenggen Quan, Cho Jui Tay
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Optical Engineering, Vol. 44, Issue 5, 050506 (May 2005). https://doi.org/10.1117/1.1906003
Abstract
An optical micro-shadowgraph for the height measurement of a micro-solderball on a semiconductor wafer is proposed. The micro-shadow image resulting from an oblique illumination onto the protruded solderball/bump on the wafer is clearly captured. Experimental investigation shows that accurate solderball height measurement can be readily obtained.
©(2005) Society of Photo-Optical Instrumentation Engineers (SPIE)
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Shihua Wang, Chenggen Quan, and Cho Jui Tay "Optical micro-shadowgraph-based method for measuring micro-solderball height," Optical Engineering 44(5), 050506 (1 May 2005). https://doi.org/10.1117/1.1906003
Published: 1 May 2005
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Cited by 3 scholarly publications and 1 patent.
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KEYWORDS
Semiconducting wafers
Wafer-level optics
Standards development
CCD image sensors
Geometrical optics
Atrial fibrillation
Image sensors
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