1 June 2005 Imaging properties of a patterned rough surface: effects of defocus
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Optical Engineering, 44(6), 063201 (2005). doi:10.1117/1.1922947
Abstract
A theoretical investigation of the effects of imaging a patterned rough surface through focus is performed, and the statistics of the image plane irradiance, as well as those of the image pattern printed in a threshold-type photoresist, are investigated. It is demonstrated that the line edge roughness in the printed image increases substantially as the image plane is moved out of focus, for both fully and partially coherent optical systems. Furthermore, the increase in line edge roughness occurs in what is considered to be an otherwise acceptable depth of focus for an ideal system.
Neil A. Beaudry, Thomas D. Milster, "Imaging properties of a patterned rough surface: effects of defocus," Optical Engineering 44(6), 063201 (1 June 2005). http://dx.doi.org/10.1117/1.1922947
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KEYWORDS
Line edge roughness

Imaging systems

Point spread functions

Monte Carlo methods

Photoresist materials

Extreme ultraviolet

Optical engineering

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