We have designed and fabricated a hollow optical waveguide with omnidirectional reflectors (ODRs) on a silicon substrate. The pattern is defined by photolithography on a (100) silicon wafer. The groove is etched by inductive coupled plasma. Plasma-enhanced chemical vapor deposition technology is used to deposit six-pair Si/SiO2 (0.111/0.258 µm) multilayer stacks on the sample. Finally, the top of the sample is covered with an identical ODR. Hence, the light is confined in a hollow waveguide.