1 May 2006 Method for measuring the lateral aberrations of a lithographic projection system with mirror-symmetric FOCAL marks
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Optical Engineering, 45(5), 053201 (2006). doi:10.1117/1.2202917
Abstract
A novel method for measuring the imaging quality of a projection system with mirror-symmetric FOCAL marks is proposed, and the principle of the method is described. Through experiments, it is demonstrated that not only the axial aberrations but also the lateral aberrations can be measured with high accuracy by the method. The advantages of the method include obtaining more aberrations than the FOCAL technique and making it much simpler to perform a full-scale measurement of the imaging quality of a lithographic projection system.
Weijie Shi, Xiangzhao Wang, Dongqing Zhang, Osami Sasaki, "Method for measuring the lateral aberrations of a lithographic projection system with mirror-symmetric FOCAL marks," Optical Engineering 45(5), 053201 (1 May 2006). http://dx.doi.org/10.1117/1.2202917
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KEYWORDS
Adaptive optics

Optical alignment

Projection systems

Lithography

Semiconducting wafers

Imaging systems

Distortion

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