1 June 2006 Influence of deposition temperature on the properties of high-reflectivity coatings
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Abstract
The effect of deposition temperature on the properties of 355-nm high-reflectivity (HR) coatings was investigated. A series of 355-nm HR coatings were deposited by electron-beam evaporation using the same deposition process, but different deposition temperatures: 200, 250, 280, and 320 °C. Transmittance and high reflectance of the samples were measured with a Lambda 900 spectrometer, and the highest reflectance, 98.7%, was achieved at a deposition temperature of 280 °C. The laser-induced damage threshold (LIDT) was measured with a 355-nm pulsed laser with a pulse width of 8 ns. It was found that the deposition temperature had a significant effect on the LIDT of coatings. LIDTs up to 18.5 J/cm2 were achieved when the deposition temperature was 280 °C. The LIDT of the coating deposited at 280 °C is about three times greater than that of coatings deposited at the other temperatures. Damage morphologies of samples at different deposition temperatures were observed with a Leica-DMRXE microscope. Microstructures of the samples were characterized by x-ray diffraction (XRD). An absorptance-dominated model is proposed, which agrees very well with the damage threshold results.
© (2006) Society of Photo-Optical Instrumentation Engineers (SPIE)
Meiqiong Zhan, Meiqiong Zhan, Tianya Tan, Tianya Tan, Dawei Zhang, Dawei Zhang, Hongbo He, Hongbo He, Jianda Shao, Jianda Shao, Zhengxiu Fan, Zhengxiu Fan, "Influence of deposition temperature on the properties of high-reflectivity coatings," Optical Engineering 45(6), 063801 (1 June 2006). https://doi.org/10.1117/1.2211647 . Submission:
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