1 July 2007 Fabrication of waveguide devices by UV photopatterning of fluorinated poly(arylene ether ketone)s containing tetrafluorostyrol moieties
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Abstract
This work demonstrates waveguide devices based on a novel photocrosslinkable fluorinated poly(arylene ether ketone). A new molecular design has enabled waveguide fabrication to be achieved for the first time using this kind of polymer, through direct UV patterning and a wet-etch process, which is faster and more convenient and economical than the process based on standard reactive-ion etching that has been applied to previously reported poly(arylene ether ketone) materials. High-quality waveguides with smooth, well-defined sidewalls have been produced, and optical splitter devices based on directional coupling are demonstrated. Optical characterization of these devices suggests that the waveguide quality is comparable to that of waveguides fabricated using a dry-etch process, and the experimental data obtained from the fabricated optical splitters are in excellent agreement with theoretical predictions.
© (2007) Society of Photo-Optical Instrumentation Engineers (SPIE)
Jia Jiang, Claire L. Callender, Julian P. Noad, Yinghua Qi, Jianfu Ding, Michael Day, "Fabrication of waveguide devices by UV photopatterning of fluorinated poly(arylene ether ketone)s containing tetrafluorostyrol moieties," Optical Engineering 46(7), 074601 (1 July 2007). https://doi.org/10.1117/1.2756099 . Submission:
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