1 December 2008 Techniques for fabrication of large-size graded reflectivity mirrors
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Abstract
According to the parameter requirements of a graded reflectivity mirror with a Gaussian profile, the layer structure and the mask pattern are designed using a graded-thickness middle layer. The mask and the automatic mask-switchover equipment are designed considering the actual requirement of the thin films and the specific deposit facility. The uniformity of the layer thickness is analyzed. The measurement results indicate that samples prepared with this technique are basically in accordance with the design parameter. The scattering effect between the material molecules and the mask, thickness errors, and the alignment error between the mask and the substrate are the main factors that influence the deposit result.
© (2008) Society of Photo-Optical Instrumentation Engineers (SPIE)
Guonuan Lv, Chaoyang Wei, Dawei Li, Jianbing Huang, Kui Yi, "Techniques for fabrication of large-size graded reflectivity mirrors," Optical Engineering 47(12), 123401 (1 December 2008). https://doi.org/10.1117/1.3027595 . Submission:
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