1 February 2008 Frequency analysis of maskless lithography system for generation of continuous phase patterns with homogeneous structure depth
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Optical Engineering, 47(2), 023002 (2008). doi:10.1117/1.2870103
Abstract
A new approach for the fabrication of continuous-relief diffractive phase patterns is presented. The approach is based on a maskless lithography system with reflective liquid crystal displays that is able to expose continuous and binary reliefs in photoresist with a resolution of 3.4 μm. Due to a spatial frequency analysis of the entire exposure system, a compensation transformation may be applied to the input data, which results in constant structure depths independent of spatial frequencies.
Carsten Glasenapp, Hans Zappe, "Frequency analysis of maskless lithography system for generation of continuous phase patterns with homogeneous structure depth," Optical Engineering 47(2), 023002 (1 February 2008). http://dx.doi.org/10.1117/1.2870103
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KEYWORDS
Photoresist materials

Modulation transfer functions

Liquid crystal on silicon

Modulation

Spatial frequencies

Maskless lithography

Electronics

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