9 February 2012 Experiments and analysis on Joule heating effect in field-assisted ion diffusion
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Abstract
Due to the Joule heating effect induced by the use of an assisting electric field, glass wafer temperature is experimentally found to increase synchronically with the flow of current during the process of field-assisted ion diffusion. A theoretical analysis demonstrates that the amplitude of the glass wafer temperature increase is dictated by competition between two factors, heat generation and heat dissipation. Heat generation and heat dissipation both become stronger as the glass wafer temperature increases. Studies have shown that the Joule heating effect can influence the waveguide manufacturing process profoundly, including aspects such as the stability of ion diffusion, theoretical modeling of the ion-diffusion process, and waveguide depth uniformity over the glass wafer.
© 2012 Society of Photo-Optical Instrumentation Engineers (SPIE)
Yinlei Hao, Yinlei Hao, Bin Zheng, Bin Zheng, Weiwei Zheng, Weiwei Zheng, Jianyi Yang, Jianyi Yang, Xiaoqing Jiang, Xiaoqing Jiang, Qiang Zhou, Qiang Zhou, Minghua Wang, Minghua Wang, Hongjian Wang, Hongjian Wang, } "Experiments and analysis on Joule heating effect in field-assisted ion diffusion," Optical Engineering 51(1), 014601 (9 February 2012). https://doi.org/10.1117/1.OE.51.1.014601 . Submission:
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