23 February 2012 Characterization of photoresist and simulation of a developed resist profile for the fabrication of gray-scale diffractive optic elements
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Abstract
We have characterized a photoresist used for the fabrication of gray-scale diffractive optic elements in terms of Dill's and Mack's model parameters. The resist model parameters were employed for the simulations of developed resist profiles for sawtooth patterns executed by solving the Eikonal equation with the fast-marching method. The simulated results were shown to be in good agreement with empirical data.
© 2012 Society of Photo-Optical Instrumentation Engineers (SPIE)
Jong Rak Park, Justin M. Sierchio, Melissa A. Zaverton, Youngsik Kim, Thomas D. Milster, "Characterization of photoresist and simulation of a developed resist profile for the fabrication of gray-scale diffractive optic elements," Optical Engineering 51(2), 023401 (23 February 2012). https://doi.org/10.1117/1.OE.51.2.023401 . Submission:
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