29 February 2012 Tunable surface plasmons interference patterns with the same mask in nanolithography
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Abstract
When a transverse magnetic-polarized beam illuminates normally on an Ag grating mask with sub-wavelength slits, the surface plasmon (SP) interference patterns are formed on the Ag surface. According to the dispersion relationship of SPs, the wavelength of SPs (λsp) is tunable by altering the refractive index of the photoresist or the illumination wavelength. Various λsp form interference patterns with different size. The interference patterns are tunable using the same mask with period microns in size, which can save the cost of fabricating a different mask. This method will have potential applications to nanolithography.
© 2012 Society of Photo-Optical Instrumentation Engineers (SPIE)
Xia Wan, Xia Wan, Qingkang Wang, Qingkang Wang, Haihua Tao, Haihua Tao, } "Tunable surface plasmons interference patterns with the same mask in nanolithography," Optical Engineering 51(2), 028001 (29 February 2012). https://doi.org/10.1117/1.OE.51.2.028001 . Submission:
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