25 February 2013 Influence of subsurface defects on damage performance of fused silica in ultraviolet laser
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Abstract
In ultraviolet pulse laser, damage performance of fused silica optics is directly dependent on the absorptive impurities and scratches in subsurface, which are induced by mechanical polishing. In the research about influence of subsurface defects on damage performance, a series of fused silica surfaces with various impurity concentrations and scratch structures were created by hydrofluoric (HF) acid solution etching. Time of Flight secondary ion mass spectrometry and scanning probe microprobe revealed that with increasing etching depth, impurity concentrations in subsurface layers are decreased, the scratch structures become smoother and the diameter:depth ratio is increased. Damage performance test with 355-nm pulse laser showed that when 600 nm subsurface thickness is removed by HF acid etching, laser-induced damage threshold of fused silica is raised by 40 percent and damage density is decreased by over one order of magnitude. Laser weak absorption was tested to explain the cause of impurity elements impacting damage performance, field enhancement caused by change of scratch structures was calculated by finite difference time domain simulation, and the calculated results are in accord with the damage test results.
© 2013 Society of Photo-Optical Instrumentation Engineers (SPIE)
Jin Huang, Xinda Zhou, Hongjie Liu, Fengrui Wang, Xiaodong Jiang, Weidong Wu, Yongjian Tang, Wanguo Zheng, "Influence of subsurface defects on damage performance of fused silica in ultraviolet laser," Optical Engineering 52(2), 024203 (25 February 2013). https://doi.org/10.1117/1.OE.52.2.024203
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