5 March 2013 Fabrication of x-ray diffractive optical elements for laser fusion applications
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We review our recent progress on the fabrication of x-ray diffractive optical elements (DOEs) by combining complementary advantages of electron beam, x-ray, and proximity optical lithography. First, an electron beam lithography tool with an accelerating voltage of 100 kV is used to expose initial x-ray mask based on SiC membrane with a low aspect ratio. Second, x-ray lithography is used to replicate x-ray DOEs and amplify the aspect ratio up to 14:1. Third, proximity optical lithography is used to fabricate a large-scale gold mesh as the supporting structures. We demonstrate that this method can achieve high aspect ratio metal nanometer structures without the need of a complicated multilayer resist process. A large number of x-ray DOEs have been fabricated with feature sizes down to 100 nm for the purpose of laser plasma fusion applications. Among them, the ninth-order diffraction peak on the positive side of the zeroth order can be observed for both 3333 and 5000  lines/mm x-ray gold transmission gratings.
© 2013 Society of Photo-Optical Instrumentation Engineers (SPIE)
Changqing Xie, Changqing Xie, Xiaoli Zhu, Xiaoli Zhu, Hailiang Li, Hailiang Li, Jiebin Niu, Jiebin Niu, Yilei Hua, Yilei Hua, Lina Shi, Lina Shi, } "Fabrication of x-ray diffractive optical elements for laser fusion applications," Optical Engineering 52(3), 033402 (5 March 2013). https://doi.org/10.1117/1.OE.52.3.033402 . Submission:


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