Implementation of uniform diffraction efficiency of partially overlapping holograms in photopolymers based on the photopolymerization of a free radical

Wei Song; Shiquan Tao; Qianli Zhai; Dayong Wang

doi:10.1117/1.OE.52.4.045801

16 April 2013 Implementation of uniform diffraction efficiency of partially overlapping holograms in photopolymers based on the photopolymerization of a free radical

Wei Song, Shiquan Tao, Qianli Zhai, Dayong Wang

Author Affiliations +

Optical Engineering, Vol. 52, Issue 4, 045801 (April 2013). https://doi.org/10.1117/1.OE.52.4.045801

Abstract

The exposure schedule model for uniform diffraction efficiency is extended to be suitable for the partially overlapping multiplexing method. The proposed model is based on solving an optimization problem. Fifty holograms were multiplexed using the exposure schedule calculated with the extended model. The material used in the experiment is based on the photopolymerization of a free radical. By comparing the intensity of the reconstructed images during recording with that readout after recording, the calculated exposure schedule is verified to be effective to realize the uniform diffraction efficiency for the multiplexing holographic storage.

CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

Citation Download Citation

Wei Song, Shiquan Tao, Qianli Zhai, and Dayong Wang "Implementation of uniform diffraction efficiency of partially overlapping holograms in photopolymers based on the photopolymerization of a free radical," Optical Engineering 52(4), 045801 (16 April 2013). https://doi.org/10.1117/1.OE.52.4.045801

Published: 16 April 2013

ACCESS THE FULL ARTICLE

JOURNAL ARTICLE
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY