9 September 2013 Fabrication of large-scale photonic phased array using a holographic lithography system
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Abstract
A holographic lithography method for fabricating large-scale photonic phased array is presented. The large-scale array could be generated using a specially designed holographic optical element and the period could be decreased by half with the help of a half-wave plate. This method provides a convenient way to obtain the photonic array with a smaller period without shortening the recording wavelength.
© 2013 Society of Photo-Optical Instrumentation Engineers (SPIE)
Shen Shaoxin, Xuechang Ren, Shou Liu, Zhilin Yang, Yuanying Zhang, "Fabrication of large-scale photonic phased array using a holographic lithography system," Optical Engineering 52(9), 095103 (9 September 2013). https://doi.org/10.1117/1.OE.52.9.095103
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