6 September 2013 Refractive index profile in ion-implanted neodymium-doped yttrium vanadate waveguide: the relation between index change and lattice damage
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Optical Engineering, 52(9), 097101 (2013). doi:10.1117/1.OE.52.9.097101
Abstract
A model is presented to explain the refractive index changes in the ion-implanted neodymium-doped yttrium vanadate waveguide region, which is helpful for characterizing index profile dependence on implantation parameters. It indicates that the lattice damage is the main factor for the refractive index changes. Waveguide structure is formed mainly due to an increase of ordinary refractive index in the ion-implanted region. The theoretical results based on this model are in good agreement with the experimental data from 500 keV Si + ion implantations and keV He + ion implantations.
© 2013 Society of Photo-Optical Instrumentation Engineers (SPIE)
Yu-Jie Ma, Fei Lu, Jiao-Jian Yin, Xiu-Hong Liu, "Refractive index profile in ion-implanted neodymium-doped yttrium vanadate waveguide: the relation between index change and lattice damage," Optical Engineering 52(9), 097101 (6 September 2013). http://dx.doi.org/10.1117/1.OE.52.9.097101
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KEYWORDS
Refractive index

Ions

Waveguides

Neodymium

Crystals

Silicon

Yttrium

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