6 August 2014 Central aperture detection for auto direct read-write photoresist fabrication and inspection
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Optical Engineering, 53(8), 084104 (2014). doi:10.1117/1.OE.53.8.084104
Abstract
We show the design for a laser scanning microscopy defect detection system based upon the idea that the light can reflect off a photoresist-laden fused-silica sample containing defects, allowing height and depth information to be obtained through changes in light intensity. Image registration using predefined points is employed. Image processing techniques involving median and deconvolution filtering are used. Results show that the 2.1-μm resolution of these defects is obtainable, and receiver operating characteristic curves are used for quantifying results. Discriminabilities of 0.73 are achieved. Preliminary results for larger-array patterns through stitching processes are also shown.
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
Justin M. Sierchio, Melissa Zaverton, Lee Johnson, Victor Densmore, Thomas Milster, "Central aperture detection for auto direct read-write photoresist fabrication and inspection," Optical Engineering 53(8), 084104 (6 August 2014). http://dx.doi.org/10.1117/1.OE.53.8.084104
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KEYWORDS
Image processing

Inspection

Raster graphics

Photoresist materials

Defect detection

Sensors

Digital filtering

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