21 September 2015 Calibrating the pupil fill balance for hypernumerical aperture lithographic objective
Author Affiliations +
Optical Engineering, 54(9), 095103 (2015). doi:10.1117/1.OE.54.9.095103
Projection objectives for deep-ultraviolet lithography typically have a dual-telecentric design, and the telecentricity in object space (mask) is idealized as zero. However, for combined illumination and objective lens systems, telecentricity matching on mask can result in a dramatic change in the pupil intensity distribution. Here, we propose a method of identifying the impact of the mismatch on the pupil fill and decoupling the pupil intensity balance from the telecentricity modulation. The technique is implemented in a user-defined program, and a series of simulations for a hypernumerical aperture immersion objective under off-axis illumination conditions verifies the method.
© 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)
Dawei Rui, Wei Zhang, Huaijiang Yang, "Calibrating the pupil fill balance for hypernumerical aperture lithographic objective," Optical Engineering 54(9), 095103 (21 September 2015). https://doi.org/10.1117/1.OE.54.9.095103

Back to Top