Automatic inspection of a residual resist layer by means of self-organizing map

Zaki S. F. Philippe; Stéphane Robert; Bernard Bayard

doi:10.1117/1.OE.55.5.054106

26 May 2016 Automatic inspection of a residual resist layer by means of self-organizing map

Zaki S. F. Philippe, Stéphane Robert, Bernard Bayard

Author Affiliations +

Optical Engineering, Vol. 55, Issue 5, 054106 (May 2016). https://doi.org/10.1117/1.OE.55.5.054106

Abstract

Photolithography allows large-scale fabrication of nanocomponents in the semiconductor industry. This technique consists of manufacturing a desired pattern on a photoresist film transferred onto the substrate during the etching process. Therefore, the mask quality is essential for reliable etching. For example, the presence of a residual layer of resist might be considered as a mask defect and can lead to the failure of the etching process. We propose the use of a Kohonen self-organizing map for automatic detection of a residual layer from an ellipsometric signature. The feasibility of the suggested inspection by the use of a classification technique is discussed and simulations are carried out on a 750-nm period grating.

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Zaki S. F. Philippe, Stéphane Robert, and Bernard Bayard "Automatic inspection of a residual resist layer by means of self-organizing map," Optical Engineering 55(5), 054106 (26 May 2016). https://doi.org/10.1117/1.OE.55.5.054106

Published: 26 May 2016

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