2 February 2016 Simulating semiconductor structures for next-generation optical inspection technologies
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Abstract
We present a technique for optimizing advanced optical imaging methods for nanoscale structures, such as those encountered in the inspection of cutting-edge semiconductor devices. The optimization flow is divided to two parts: simulating light-structure interaction using the finite-difference time-domain (FDTD) method and simulating the optical imaging system by means of its optical transfer function. As a case study, FDTD is used to simulate 10-nm silicon line-space and static random-access memory patterns, with irregular structural protrusions and silicon-oxide particles as defects of interest. An ultraviolet scanning-spot optical microscope is used to detect these defects, and the optimization flow is used to find the optimal imaging mode for detection.
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
Ori Golani, Ori Golani, Ido Dolev, Ido Dolev, James Pond, James Pond, Jens Niegemann, Jens Niegemann, } "Simulating semiconductor structures for next-generation optical inspection technologies," Optical Engineering 55(2), 025102 (2 February 2016). https://doi.org/10.1117/1.OE.55.2.025102 . Submission:
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