25 April 2016 Improved environmental stability for plasma enhanced chemical vapor deposition SiO2 waveguides using buried channel designs
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Abstract
Ridge and buried channel waveguides (BCWs) made using plasma-enhanced chemical vapor deposition SiO2 were fabricated and tested after being subjected to long 85°C water baths. The water bath was used to investigate the effects of any water absorption in the ridge and BCWs. Optical mode spreading and power throughput were measured over a period of three weeks. The ridge waveguides quickly absorbed water within the critical guiding portion of the waveguide. This caused a nonuniformity in the refractive index profile, leading to poor modal confinement after only seven days. The BCWs possessed a low index top cladding layer of SiO2, which caused an increase in the longevity of the waveguides, and after 21 days, the BCW samples still maintained ∼20% throughput, much higher than the ridge waveguides, which had a throughput under 5%.
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
Thomas A. Wall, Roger P. Chu, Joshua W. Parks, Damla Ozcelik, Holger Schmidt, Aaron R. Hawkins, "Improved environmental stability for plasma enhanced chemical vapor deposition SiO2 waveguides using buried channel designs," Optical Engineering 55(4), 040501 (25 April 2016). https://doi.org/10.1117/1.OE.55.4.040501 . Submission:
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