11 July 2016 Improving the laser-induced damage threshold of 532-nm antireflection coating using plasma ion cleaning
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Abstract
BK7 glass substrates were precleaned by different cleaning procedures before being loaded into a vacuum chamber, and then a series of plasma ion cleaning procedures were conducted at different bias voltages in the vacuum chamber, prior to the deposition of 532-nm antireflection (AR) coatings. The plasma ion cleaning process was implemented by the plasma ion bombardment from an advanced plasma source. The surface morphology of the plasma ion-cleaned substrate, as well as the laser-induced damage threshold (LIDT) of the 532-nm AR coating was investigated. The results indicated that the LIDT of 532-nm AR coating can be greatly influenced by the plasma ion cleaning energy. The plasma ion cleaning with lower energy is an attractive method to improve the LIDT of the 532-nm AR coating, due to the removal of the adsorbed contaminations on the substrate surface, as well as the removal of part of the chemical impurities hidden in the surface layer.
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
Meiping Zhu, Huanbin Xing, Yingjie Chai, Kui Yi, Jian Sun, Jianguo Wang, Jianda Shao, "Improving the laser-induced damage threshold of 532-nm antireflection coating using plasma ion cleaning," Optical Engineering 56(1), 011003 (11 July 2016). https://doi.org/10.1117/1.OE.56.1.011003 . Submission:
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