25 January 2017 Retardation of sol–gel titanium oxide with imprinted grating structure
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Abstract
We fabricated a titanium oxide grating using an imprinting technique and a sol–gel method and evaluated phase retardation. A titanium oxide grating with 75 nm depth, fill factor of 0.3, and 400 nm period was obtained by imprinting a titanium oxide sol solution on a silicone (polydimethylsiloxane; PDMS) mold at 150°C. As a result of phase retardation evaluation, it reached 9.2 deg at the 532-nm wavelength.
© 2017 Society of Photo-Optical Instrumentation Engineers (SPIE)
Itsunari Yamada, Yoshiro Ishihara, Tsuyoshi Akiyama, "Retardation of sol–gel titanium oxide with imprinted grating structure," Optical Engineering 56(1), 017108 (25 January 2017). https://doi.org/10.1117/1.OE.56.1.017108 . Submission: Received: 13 October 2016; Accepted: 4 January 2017
Received: 13 October 2016; Accepted: 4 January 2017; Published: 25 January 2017
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