23 December 2017 Nanostructure formation and regulation during low-energy ion beam sputtering of fused silica surfaces
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Abstract
Ion beam sputtering (IBS) possesses strong surface nanostructuring behaviors, where dual microscopic phenomenon can be aroused to induce the formation of ultrasmooth surfaces or regular nanostructures. Low-energy IBS of fused silica surfaces is investigated to discuss the formation mechanism and the regulation of the IBS-induced nanostructures. The research results indicate that these microscopic phenomena can be attributed to the interaction of the IBS-induced surface roughening and smoothing effects, and the interaction process strongly depends on the sputtering conditions. Alternatively, ultrasmooth surface or regular nanostructure can be selectively generated through the regulation of the nanostructuring process, and the features of the generated nanostructures, such as amplitude and period, also can be regulated. Consequently, two different technology aims of nanofabrication, including nanometer-scale and nanometer-precision fabrication, can be realized, respectively. These dual microscopic mechanisms distinguish IBS as a promising nanometer manufacturing technology for the optical surfaces.
© 2017 Society of Photo-Optical Instrumentation Engineers (SPIE)
Wenlin Liao, Yi-Fan Dai, Xutao Nie, Xuqing Nie, Mingjin Xu, "Nanostructure formation and regulation during low-energy ion beam sputtering of fused silica surfaces," Optical Engineering 56(12), 125102 (23 December 2017). https://doi.org/10.1117/1.OE.56.12.125102 . Submission: Received: 25 August 2017; Accepted: 5 December 2017
Received: 25 August 2017; Accepted: 5 December 2017; Published: 23 December 2017
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