23 February 2018 Quasicommon-path digital holographic microscopy with phase aberration compensation based on a long-working distance objective
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Abstract
We present a quasicommon-path digital holographic microscopy with phase aberration compensation, which is based on a long-working distance objective and can be used for the quantitative characterization of microstructure specimens. The quasicommon-path arrangement makes the holographic system very compact and stable. Meanwhile, the object and reference beams all travel along the same path, which can effectively eliminate the system aberration, and the mirror in the reference arm can be adjusted precisely for the phase tilt compensation. In the experiment, a wafer with orderly patterns and unified height of 180 nm is measured, and its three-dimensional surface topography is obtained. A long-term system stability of 1.39 nm is achieved in measurement with the proposed method.
© 2018 Society of Photo-Optical Instrumentation Engineers (SPIE)
Jianglei Di, Jianglei Di, Kaiqiang Wang, Kaiqiang Wang, Jiwei Zhang, Jiwei Zhang, Chaojie Ma, Chaojie Ma, Teli Xi, Teli Xi, Ying Li, Ying Li, Kun Wei, Kun Wei, Weijuan Qu, Weijuan Qu, Jianlin Zhao, Jianlin Zhao, } "Quasicommon-path digital holographic microscopy with phase aberration compensation based on a long-working distance objective," Optical Engineering 57(2), 024108 (23 February 2018). https://doi.org/10.1117/1.OE.57.2.024108 . Submission: Received: 1 December 2017; Accepted: 30 January 2018
Received: 1 December 2017; Accepted: 30 January 2018; Published: 23 February 2018
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