9 February 2018 Study on Brewster angle thin film polarizer using hafnia–silica mixture as high-refractive-index material
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Optical Engineering, 57(2), 025101 (2018). doi:10.1117/1.OE.57.2.025101
Abstract
Two kinds of polarizer coatings were prepared by electron beam evaporation, using HfO2–SiO2 mixture and HfO2 as the high-refractive-index materials, respectively. The HfO2–SiO2 mixture layer was implemented by coevaporating SiO2 and metal Hf, the materials were deposited at an oxygen atmosphere to achieve stoichiometric coatings. The certain HfO2 and SiO 2 content ratio is controlled by adjusting the deposition rate of HfO2 and SiO2 using individual quartz crystal monitor. The spectral performance, surface and interfacial properties, as well as the laser-induced damage performance were studied and compared. Comparing with polarizer coating using HfO2 as high-refractive-index material, the polarizer coating using HfO2–SiO2 mixture as high-refractive-index material shows better performance with broader polarizing bandwidth, lower surface roughness, better interfacial property while maintaining high laser-induced damage threshold.
© 2018 Society of Photo-Optical Instrumentation Engineers (SPIE)
Nuo Xu, Meiping Zhu, Jian Sun, Yingjie Chai, Kui Yi, Yuanan Zhao, Jianda Shao, "Study on Brewster angle thin film polarizer using hafnia–silica mixture as high-refractive-index material," Optical Engineering 57(2), 025101 (9 February 2018). https://doi.org/10.1117/1.OE.57.2.025101 Submission: Received 12 September 2017; Accepted 17 January 2018
Submission: Received 12 September 2017; Accepted 17 January 2018
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