Dual-mode snapshot interferometric system for on-machine metrology

Xiaobo Tian; Yu Zhang; Alexander Sohn; Oliver J. Spires; Rongguang Liang

doi:10.1117/1.OE.58.4.044104

30 April 2019 Dual-mode snapshot interferometric system for on-machine metrology

Xiaobo Tian, Yu Zhang, Alexander Sohn, Oliver J. Spires, Rongguang Liang

Author Affiliations +

Optical Engineering, Vol. 58, Issue 4, 044104 (April 2019). https://doi.org/10.1117/1.OE.58.4.044104

Abstract

For the first time, we present a dual-mode snapshot interferometric system for measuring both surface shape and surface roughness to meet the need for on-machine metrology in optical fabrication. Two different modes, interferometer mode and interference microscopy mode, are achieved using Linnik configuration. To realize snapshot measurement, a pixelated polarization camera is used to capture four phase-shifted interferograms simultaneously. We have demonstrated its performance for off-line metrology and on-machine metrology by mounting it on a diamond turning machine.

Citation Download Citation

Xiaobo Tian, Yu Zhang, Alexander Sohn, Oliver J. Spires, and Rongguang Liang "Dual-mode snapshot interferometric system for on-machine metrology," Optical Engineering 58(4), 044104 (30 April 2019). https://doi.org/10.1117/1.OE.58.4.044104

Received: 11 December 2018; Accepted: 9 April 2019; Published: 30 April 2019

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