Near-infrared bilayer nanowire grid polarizer array fabricated using soft nanoimprint lithography

Jinkui Chu; Weidong Kang; Xiangwei Zeng; Ze Liu

doi:10.1117/1.OE.58.5.057101

8 May 2019 Near-infrared bilayer nanowire grid polarizer array fabricated using soft nanoimprint lithography

Jinkui Chu, Weidong Kang, Xiangwei Zeng, Ze Liu

Author Affiliations +

Optical Engineering, Vol. 58, Issue 5, 057101 (May 2019). https://doi.org/10.1117/1.OE.58.5.057101

Abstract

We fabricated a cost-effective and tractable near-infrared nanowire grid polarizer array with six different directional grating elements on a Borofloat 33 glass substrate at once using a soft nanoimprint and metal thermal evaporation process. Each element consists of a 200-nm period bilayer Al grating with an area of 1.3 × 1.3 mm². Scanning electron microscopy images reveal that each unit of the polarizer array has an intact nanostructure without large-area damage. Meanwhile, the TM transmittance of each element exceeds 65% in the wavelength range of 1 to 2.5 μm, and of particular note, it is >70 % in the wavelength range of 1.2 to 2.5 μm. The extinction ratio is more than 20 dB in 1.38- to 2.5-μm wavelength range, proving that the polarizer array has good polarization characteristics. Such a polarizer array has low costs and better compatibility with microfabrication processes, which can be used as an element of near-infrared polarization image detection equipment.

Citation Download Citation

Jinkui Chu, Weidong Kang, Xiangwei Zeng, and Ze Liu "Near-infrared bilayer nanowire grid polarizer array fabricated using soft nanoimprint lithography," Optical Engineering 58(5), 057101 (8 May 2019). https://doi.org/10.1117/1.OE.58.5.057101

Received: 16 January 2019; Accepted: 1 April 2019; Published: 8 May 2019

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