Open Access
19 October 2023 Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral photoinhibition lithography (Erratum)
Dazhao Zhu, Liang Xu, Chenliang Ding, Zhenyao Yang, Yiwei Qiu, Chun Cao, Hongyang He, Jiawei Chen, Mengbo Tang, Lanxin Zhan, Xiaoyi Zhang, Qiuyuan Sun, Chengpeng Ma, Zhen Wei, Wenjie Liu, Xiang Fu, Cuifang Kuang, Haifeng Li, Xu Liu
Author Affiliations +
Abstract

The erratum lists corrections to the published article.

This article [Adv. Photon. 4(6), 066002 (2022) doi: 10.1117/1.AP.4.6.066002 was originally published on 23 November 2022 with some minor errors.

  • In section 3.2, a reference (Ref. 33) was missing in the first sentence. It was already listed in the References list and correctly cited in another portion of the text.

  • Section 3.2, the second sentence incorrectly referred to the “pattern in Fig. 2"; the pattern was specific to Fig. S6 in the Supplemental Material.

  • In section 3.3, the device information “Nikon, NA 1.45, Japan” was incorrect. The correct device information is “Olympus, NA 1.40, Tokyo, Japan”; the correct sentence is “The objective lens was changed to 40× (Olympus, NA 1.40, Tokyo, Japan), and the focal-spot speed was 50 mm/s [step size: 100 nm (x) × 100 nm (y) × 200 nm (z)].”

  • In section 3.3, first paragraph, in the last sentence, an incorrect subfigure was mentioned as “Figs. 4(b) and 4(c)”; the correct sentence is “Three-fold stitching was required, and the areas printed by different spots are marked by different colors in Figs. 4(b) and 4(e).” Likewise, a sentence of the caption for Fig. 4 mistakenly indicated panels (b) and (c), rather than panels (b) and (e); the correct sentence is “In (b) and (e), the portions corresponding to the light-blue stripes were printed by channel 1, and those indicated by the dark-red stripes were printed by channel 2.”

  • In the supplemental material on page 6, the device information was incorrectly listed as “CTI-800"; the correct device information is CTI8310K.

No reported results were affected by the errors. The article was corrected and republished on 22 September 2023.

CC BY: © The Authors. Published by SPIE and CLP under a Creative Commons Attribution 4.0 International License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
Dazhao Zhu, Liang Xu, Chenliang Ding, Zhenyao Yang, Yiwei Qiu, Chun Cao, Hongyang He, Jiawei Chen, Mengbo Tang, Lanxin Zhan, Xiaoyi Zhang, Qiuyuan Sun, Chengpeng Ma, Zhen Wei, Wenjie Liu, Xiang Fu, Cuifang Kuang, Haifeng Li, and Xu Liu "Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral photoinhibition lithography (Erratum)," Advanced Photonics 5(5), 059801 (19 October 2023). https://doi.org/10.1117/1.AP.5.5.059801
Published: 19 October 2023
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KEYWORDS
Diffraction

Lithography

Multiphoton lithography

Control systems

Engineering

Lithium

Optical instrument design

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