Open Access
19 October 2023 Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral photoinhibition lithography (Erratum)
Dazhao Zhu, Liang Xu, Chenliang Ding, Zhenyao Yang, Yiwei Qiu, Chun Cao, Hongyang He, Jiawei Chen, Mengbo Tang, Lanxin Zhan, Xiaoyi Zhang, Qiuyuan Sun, Chengpeng Ma, Zhen Wei, Wenjie Liu, Xiang Fu, Cuifang Kuang, Haifeng Li, Xu Liu
Author Affiliations +
Abstract

The erratum lists corrections to the published article.

CC BY: © The Authors. Published by SPIE and CLP under a Creative Commons Attribution 4.0 International License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
Dazhao Zhu, Liang Xu, Chenliang Ding, Zhenyao Yang, Yiwei Qiu, Chun Cao, Hongyang He, Jiawei Chen, Mengbo Tang, Lanxin Zhan, Xiaoyi Zhang, Qiuyuan Sun, Chengpeng Ma, Zhen Wei, Wenjie Liu, Xiang Fu, Cuifang Kuang, Haifeng Li, and Xu Liu "Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral photoinhibition lithography (Erratum)," Advanced Photonics 5(5), 059801 (19 October 2023). https://doi.org/10.1117/1.AP.5.5.059801
Published: 19 October 2023
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KEYWORDS
Diffraction

Lithography

Multiphoton lithography

Control systems

Engineering

Lithium

Optical instrument design

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