Journal of Micro/Nanolithography, MEMS, and MOEMS

Editor-in-Chief: Chris A. Mack, Lithoguru.com, USA

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

Journal of Micro/Nanolithography, MEMS, and MOEMS

Absorption coefficient of metal-containing photoresists in the extreme ultraviolet

Roberto Fallica et al.

High-efficiency passive micromixer using three-dimensional printed molds

Shayan Valijam et al.

Modeling fluid transport in two-dimensional paper networks

Jaione Tirapu-Azpiroz et al.

June 2018

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  • Rigorous and prompt peer review (median time from submission to first decision: 36 days)
  • Rapid, e-first publication of articles (median time from acceptance to online publication, including copyediting and typesetting: 24 days)
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  • Open access publication option at a low cost
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  • Integration with Code Ocean, a cloud-based code development and publishing platform

 

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