Journal of Micro/Nanolithography, MEMS, and MOEMS

Editor-in-Chief: Chris A. Mack, Lithoguru.com, USA

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

Journal of Micro/Nanolithography, MEMS, and MOEMS

Model-based guiding pattern synthesis for robust assembly of contact layers using directed self-assembly

Joydeep Mitra et al.

Ball-milled dispersed network of graphene platelets as thermal interface materials for high-efficiency heat dissipation of electronic devices

Tien-Chan Chang, Chun-An Liao, Zhi-Yu Li, and Yiin-Kuen Fuh

Ultralow-frequency PiezoMEMS energy harvester using thin-film silicon and parylene substrates

Nathan Jackson et al.

April 2018

TOP DOWNLOADS

from the Journal of Micro/Nanolithography, MEMS, and MOEMS


Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching

Joshua M. Duran, Andrew Sarangan (2017) Open Access


Fabrication and analysis of metallic nanoslit structures: advancements in the nanomasking method

Stephen J. Bauman, Ahmad A. Darweesh, Desalegn T. Debu, Joseph B. Herzog (2018) Open Access


Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application

Mohammed Ashraf, Sree V. Sundararajan, Gianluca Grenci (2017) Open Access


Black silicon integrated aperture

Tianbo Liu, David L. Dickensheets (2017)


Surface feature engineering through nanosphere lithography

Tod V. Laurvick, Ronald A. Coutu, Jr., James M. Sattler, Robert A. Lake (2016) Open Access


Stochastic effects in EUV lithography: random, local CD variability, and printing failures

Peter De Bisschop et al. (2017)


Development of extreme ultraviolet scatterometer using multiple orders of high-harmonic generation

Yi-Sha Ku, Wei-Ting Wang, Yi-Chang Chen, Ming-Chang Chen, Chia-Liang Yeh, Chun-Wei Lo (2018) Open Access


Photoresist and stochastic modeling

Steven G. Hansen (2018)


kW-class picosecond thin-disc prepulse laser Perla for efficient EUV generation

Akira Endo, Martin Smrž, Jiří Mužík, Ondřej Novák, Michal Chyla, Tomáš Mocek (2017) Open Access


Three-dimensional patterning in polymer optical waveguides using focused ion beam milling

Kevin Kruse, Derek Burrell, Christopher Middlebrook (2016) Open Access


Video introduction to the journal

Author benefits:

  • Rigorous and prompt peer review (median time from submission to first decision: 36 days)
  • Rapid, e-first publication of articles (median time from acceptance to online publication, including copyediting and typesetting: 24 days)
  • Professional copyediting and typesetting
  • Free online color figures
  • Free inclusion of videos and multimedia 
  • Open access publication option at a low cost
  • 5 free downloads from the SPIE Digital Library for authors
  • Integration with Code Ocean, a cloud-based code development and publishing platform

 

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