Editor-in-Chief: Chris A. Mack, Lithoguru.com, USA
The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.
Absorption coefficient of metal-containing photoresists in the extreme ultraviolet
Roberto Fallica et al.
.jpg)
High-efficiency passive micromixer using three-dimensional printed molds
Shayan Valijam et al.
Modeling fluid transport in two-dimensional paper networks
Jaione Tirapu-Azpiroz et al.
June 2018
TOP DOWNLOADS
from the Journal of Micro/Nanolithography, MEMS, and MOEMS
Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching
Joshua M. Duran, Andrew Sarangan (2017)
Control of optical nanometer gap shapes made via standard lithography using atomic layer deposition
Jiyeah Rhie et al. (2018)
kW-class picosecond thin-disc prepulse laser Perla for efficient EUV generation
Akira Endo, Martin Smrž, Jiří Mužík, Ondřej Novák, Michal Chyla, Tomáš Mocek (2017)
Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application
Mohammed Ashraf, Sree V. Sundararajan, Gianluca Grenci (2017)
Current understanding of the electrostatic risk to reticles used in microelectronics and similar manufacturing processes
Gavin C. Rider (2018)
Large area gratings by x-ray LIGA dynamic exposure for x-ray phase-contrast imaging
Tobias J. Schröter et al. (2017)
Fabrication and analysis of metallic nanoslit structures: advancements in the nanomasking method
Stephen J. Bauman, Ahmad A. Darweesh, Desalegn T. Debu, Joseph B. Herzog (2018)
Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy
Yu Zhang et al. (2017)
Surface feature engineering through nanosphere lithography
Tod V. Laurvick, Ronald A. Coutu, Jr., James M. Sattler, Robert A. Lake (2016)
Fabrication of quartz microcylinders by laser interference lithography for angular optical tweezers
Zhanna Santybayeva et al. (2016)
Video introduction to the journal
Author benefits:
- Rigorous and prompt peer review (median time from submission to first decision: 36 days)
- Rapid, e-first publication of articles (median time from acceptance to online publication, including copyediting and typesetting: 24 days)
- Professional copyediting and typesetting
- Free online color figures
- Free inclusion of videos and multimedia
- Open access publication option at a low cost
- 5 free downloads from the SPIE Digital Library for authors
- Integration with Code Ocean, a cloud-based code development and publishing platform
