Editor-in-Chief: Chris A. Mack, Lithoguru.com, USA
The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.
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Model-based guiding pattern synthesis for robust assembly of contact layers using directed self-assembly
Joydeep Mitra et al.
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Ball-milled dispersed network of graphene platelets as thermal interface materials for high-efficiency heat dissipation of electronic devices
Tien-Chan Chang, Chun-An Liao, Zhi-Yu Li, and Yiin-Kuen Fuh
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Ultralow-frequency PiezoMEMS energy harvester using thin-film silicon and parylene substrates
Nathan Jackson et al.
April 2018
TOP DOWNLOADS
from the Journal of Micro/Nanolithography, MEMS, and MOEMS
Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching
Joshua M. Duran, Andrew Sarangan (2017)
Fabrication and analysis of metallic nanoslit structures: advancements in the nanomasking method
Stephen J. Bauman, Ahmad A. Darweesh, Desalegn T. Debu, Joseph B. Herzog (2018)
Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application
Mohammed Ashraf, Sree V. Sundararajan, Gianluca Grenci (2017)
Black silicon integrated aperture
Tianbo Liu, David L. Dickensheets (2017)
Surface feature engineering through nanosphere lithography
Tod V. Laurvick, Ronald A. Coutu, Jr., James M. Sattler, Robert A. Lake (2016)
Stochastic effects in EUV lithography: random, local CD variability, and printing failures
Peter De Bisschop et al. (2017)
Development of extreme ultraviolet scatterometer using multiple orders of high-harmonic generation
Yi-Sha Ku, Wei-Ting Wang, Yi-Chang Chen, Ming-Chang Chen, Chia-Liang Yeh, Chun-Wei Lo (2018)
Photoresist and stochastic modeling
Steven G. Hansen (2018)
kW-class picosecond thin-disc prepulse laser Perla for efficient EUV generation
Akira Endo, Martin Smrž, Jiří Mužík, Ondřej Novák, Michal Chyla, Tomáš Mocek (2017)
Three-dimensional patterning in polymer optical waveguides using focused ion beam milling
Kevin Kruse, Derek Burrell, Christopher Middlebrook (2016)
Video introduction to the journal
Author benefits:
- Rigorous and prompt peer review (median time from submission to first decision: 36 days)
- Rapid, e-first publication of articles (median time from acceptance to online publication, including copyediting and typesetting: 24 days)
- Professional copyediting and typesetting
- Free online color figures
- Free inclusion of videos and multimedia
- Open access publication option at a low cost
- 5 free downloads from the SPIE Digital Library for authors
- Integration with Code Ocean, a cloud-based code development and publishing platform
