Journal of Micro/Nanolithography, MEMS, and MOEMS

Editor-in-Chief: Chris A. Mack, Lithoguru.com, USA

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

Journal of Micro/Nanolithography, MEMS, and MOEMS

Special Section on Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects

Guest Editors: John Robinson, Tim Brunner, and Gian Lorusso

Absorption coefficient of metal-containing photoresists in the extreme ultraviolet

Roberto Fallica et al.

High-efficiency passive micromixer using three-dimensional printed molds

Shayan Valijam et al.

July 2018

TOP DOWNLOADS

from the Journal of Micro/Nanolithography, MEMS, and MOEMS


Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching

Joshua M. Duran, Andrew Sarangan (2017) Open Access


Control of optical nanometer gap shapes made via standard lithography using atomic layer deposition

Jiyeah Rhie et al. (2018) Open Access


Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application

Mohammed Ashraf, Sree V. Sundararajan, Gianluca Grenci (2017) Open Access


Surface affinity role in graphoepitaxy of lamellar block copolymers

Guillaume Claveau et al. (2016)


Effective–CD: a contribution toward the consideration of line edge roughness in the scatterometric critical dimension metrology

Bartosz Bilski, Karsten Frenner, Wolfgang Osten (2017) Open Access


Current understanding of the electrostatic risk to reticles used in microelectronics and similar manufacturing processes

Gavin C. Rider (2018) Open Access


Surface feature engineering through nanosphere lithography

Tod V. Laurvick, Ronald A. Coutu, Jr., James M. Sattler, Robert A. Lake (2016) Open Access


Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy

Yu Zhang et al. (2017) Open Access


kW-class picosecond thin-disc prepulse laser Perla for efficient EUV generation

Akira Endo, Martin Smrž, Jiří Mužík, Ondřej Novák, Michal Chyla, Tomáš Mocek (2017) Open Access


Fabrication and analysis of metallic nanoslit structures: advancements in the nanomasking method

Stephen J. Bauman, Ahmad A. Darweesh, Desalegn T. Debu, Joseph B. Herzog (2018) Open Access


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Author benefits:

  • Rigorous and prompt peer review (median time from submission to first decision: 36 days)
  • Rapid, e-first publication of articles (median time from acceptance to online publication, including copyediting and typesetting: 24 days)
  • Professional copyediting and typesetting
  • Free online color figures
  • Free inclusion of videos and multimedia 
  • Open access publication option at a low cost
  • 5 free downloads from the SPIE Digital Library for authors
  • Integration with Code Ocean, a cloud-based code development and publishing platform

 

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