Editor-in-Chief: Chris A. Mack, Lithoguru.com, USA
The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.
Special Section on Extreme Ultraviolet Lithography for the 3-nm Node and Beyond
Guest editors:
Vivek Bakshi, Hakaru Mizoguchi, Ted Liang, Andrew Grenville, Jos Benschop
Design and fabrication of resonator-quantum well infrared photodetector for SF6 gas sensor application
Jason Sun et al.
Multitaper and multisegment spectral estimation of line-edge roughness
Yao Luo and Serap A. Savari
July 2017
TOP DOWNLOADS
from the Journal of Micro/Nanolithography, MEMS, and MOEMS
Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching
Joshua M. Duran, Andrew Sarangan (2017)
Effective–CD: a contribution toward the consideration of line edge roughness in the scatterometric critical dimension metrology
Bartosz Bilski, Karsten Frenner, Wolfgang Osten (2017)
Surface feature engineering through nanosphere lithography
Tod V. Laurvick, Ronald A. Coutu, Jr., James M. Sattler, Robert A. Lake (2016)
Lithographic stochastics: beyond 3σ
Robert L. Bristol, Marie E. Krysak (2017)
Multiwavelength Raman characterization of silicon stress near through-silicon vias and its inline monitoring applications
Woo Sik Yoo, Jae Hyun Kim, Seung Min Han (2014)
Site-specific metrology, inspection, and failure analysis of three-dimensional interconnects using focused ion beam technology
Frank Altmann, Richard J. Young (2014)
Development of TiO2 containing hardmasks through plasma-enhanced atomic layer deposition
Anuja De Silva, et al. (2017)
Theoretical study for aerial image intensity in resist in high numerical aperture projection optics and experimental verification
Masato Shibuya, Akira Takada, Toshiharu Nakashima (2016)
High-performance extended gate field-effect-transistor-based dissolved carbon dioxide sensing system with a packaged microreference electrode
Chia-Hsu Hsieh, Wei-Che Hung, Po-Han Chen, I-Yu Huang (2014)
Pattern inspection of etched multilayer extreme ultraviolet mask
Susumu Iida, Ryoichi Hirano, Tsuyoshi Amano, Hidehiro Watanabe (2016)
Video introduction to the journal
Author benefits:
- Rigorous and prompt peer review (median time from submission to first decision: 36 days)
- Rapid, e-first publication of articles (median time from acceptance to online publication, including copyediting and typesetting: 24 days)
- Professional copyediting and typesetting
- Free online color figures
- Free inclusion of videos and multimedia
- Open access publication option at a low cost
- 5 free downloads from the SPIE Digital Library for authors
