journal of micro nanolithography mems and moems
VOL. 16 · NO. 3 | July 2017
CONTENTS
Editorial
Chris Mack
JM3 16(3), 030101 (20 September 2017) doi:10.1117/1.JMM.16.3.030101
Lithography
Congying Fan, Xuelin Wang, Long Liu, Jian Zhang, Yushuang Cui, Peng Zhan, Changsheng Yuan, Haixiong Ge, Zhenlin Wang, Yanfeng Chen
JM3 16(3), 033501 (30 June 2017) doi:10.1117/1.JMM.16.3.033501
TOPICS: Nanolithography, Metals, Gold, Nickel, Nanoimprint lithography, Nanotechnology, Etching, Optical storage, Biosensing, Optical components
JM3 16(3), 033502 (25 July 2017) doi:10.1117/1.JMM.16.3.033502
JM3 16(3), 033503 (21 August 2017) doi:10.1117/1.JMM.16.3.033503
TOPICS: Directed self assembly, System on a chip, Picosecond phenomena, Polymethylmethacrylate, Optical lithography, Scanning electron microscopy, Polymers, Annealing, Semiconducting wafers, Lithography
JM3 16(3), 033504 (24 August 2017) doi:10.1117/1.JMM.16.3.033504
TOPICS: Lithography, Neural networks, Convolution, Neurons, Machine learning, Photomasks, Performance modeling, Feature extraction, Convolutional neural networks, Sensors
JM3 16(3), 033505 (24 August 2017) doi:10.1117/1.JMM.16.3.033505
TOPICS: Photomasks, Lithographic illumination, Immersion lithography, Phase shifts, Etching, Picosecond phenomena, Diffraction, Lithography, Scanners, Manufacturing
JM3 16(3), 033506 (28 August 2017) doi:10.1117/1.JMM.16.3.033506
TOPICS: Oxides, Polymers, Extreme ultraviolet, Optical lithography, Head-mounted displays, Etching, Atomic layer deposition, Chemistry, Plasma enhanced chemical vapor deposition, Printing
JM3 16(3), 033507 (8 September 2017) doi:10.1117/1.JMM.16.3.033507
TOPICS: Photoresist materials, Maskless lithography, Lithography, Convolution, Optimization (mathematics), Photoresist developing, Process modeling, Matrices, Model-based design, Optical simulations
Jinhai Shao, Jianan Deng, W. Lu, Yifang Chen
JM3 16(3), 033508 (12 September 2017) doi:10.1117/1.JMM.16.3.033508
Lijun Zhao, Lisong Dong, Wenhui Chen, Yayi Wei, Tianchun Ye, Liwan Yue, Yuntao Jiang, Qiang Wu
JM3 16(3), 033509 (13 September 2017) doi:10.1117/1.JMM.16.3.033509
Jarich Haitjema, Yu Zhang, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, Albert Brouwer
JM3 16(3), 033510 (15 September 2017) doi:10.1117/1.JMM.16.3.033510
Temitope Onanuga, Maximilian Rumler, Andreas Erdmann
JM3 16(3), 033511 (20 September 2017) doi:10.1117/1.JMM.16.3.033511
Metrology
JM3 16(3), 034001 (22 August 2017) doi:10.1117/1.JMM.16.3.034001
TOPICS: Line edge roughness, Diode pumped solid state lasers, Statistical analysis, Error analysis, Signal to noise ratio, Metrology, Edge roughness, Scanning electron microscopy, Semiconductors, Resolution enhancement technologies
Microfabrication
Mohammed Ashraf, Sree Sundararajan, Gianluca Grenci
JM3 16(3), 034501 (10 July 2017) doi:10.1117/1.JMM.16.3.034501
TOPICS: Reactive ion etching, Etching, Silicon, Oxygen, Gases, Photoresist materials, Oxides
Wenhe Zhou, Xuan He, Jianyun Wu, Liang-Bi Wang, Liangcheng Wang
JM3 16(3), 034502 (4 August 2017) doi:10.1117/1.JMM.16.3.034502
Xiaoli Zhu, Hailiang Li, Leifeng Cao, Shenye Liu, Peixiong Shi, Changqing Xie
JM3 16(3), 034503 (19 August 2017) doi:10.1117/1.JMM.16.3.034503
TOPICS: X-rays, Electron beam lithography, X-ray diffraction, X-ray lithography, Gold, X-ray characterization, Nanofabrication, Diffraction gratings, Photomasks, Diffraction
JM3 16(3), 034504 (1 September 2017) doi:10.1117/1.JMM.16.3.034504
TOPICS: Sensors, Etching, Quantum efficiency, Infrared radiation, Semiconducting wafers, Infrared photography, Photodetectors, Staring arrays, Optical instrument design, Absorption
JM3 16(3), 034505 (19 September 2017) doi:10.1117/1.JMM.16.3.034505
Microelectromechanical systems (MEMS)
Mochtar Chandra, Shi-Yu Ke, Rongshun Chen, Cheng-Yao Lo
JM3 16(3), 035001 (20 July 2017) doi:10.1117/1.JMM.16.3.035001
TOPICS: Spatial resolution, Sensors, Capacitors, Device simulation, Detector development, Data analysis
Hao Qu, Huijun Yu, Bei Peng, Peng Peng, Hao Wang, Xiaoping He, Wu Zhou
JM3 16(3), 035002 (19 August 2017) doi:10.1117/1.JMM.16.3.035002
TOPICS: Dielectrics, Structural sensing, Signal attenuation, Information operations, Signal processing, Electrodes, Sensing systems, Magnesium, Microelectromechanical systems, Temperature metrology
Errata
JM3 16(3), 039801 (19 September 2017) doi:10.1117/1.JMM.16.3.039801
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