journal of micro nanolithography mems and moems
VOL. 16 · NO. 3 | July 2017
CONTENTS
Lithography
Congying Fan, Xuelin Wang, Long Liu, Jian Zhang, Yushuang Cui, Peng Zhan, Changsheng Yuan, Haixiong Ge, Zhenlin Wang, Yanfeng Chen
JM3 16(3), 033501 (30 June 2017) doi:10.1117/1.JMM.16.3.033501
TOPICS: Nanolithography, Metals, Gold, Nickel, Nanoimprint lithography, Nanotechnology, Etching, Optical storage, Biosensing, Optical components
Michael Lam, Chris Clifford, Ananthan Raghunathan, Germain Fenger, Kostas Adam
JM3 16(3), 033502 (25 July 2017) doi:10.1117/1.JMM.16.3.033502
Jan Doise, Boon Teik Chan, Masafumi Hori, Roel Gronheid
JM3 16(3), 033503 (21 August 2017) doi:10.1117/1.JMM.16.3.033503
Metrology
Yao Luo, Serap A. Savari
JM3 16(3), 034001 (22 August 2017) doi:10.1117/1.JMM.16.3.034001
Microfabrication
Mohammed Ashraf, Sree Sundararajan, Gianluca Grenci
JM3 16(3), 034501 (10 July 2017) doi:10.1117/1.JMM.16.3.034501
TOPICS: Reactive ion etching, Etching, Silicon, Oxygen, Gases, Photoresist materials, Oxides
Wenhe Zhou, Xuan He, Jianyun Wu, Liang-Bi Wang, Liangcheng Wang
JM3 16(3), 034502 (4 August 2017) doi:10.1117/1.JMM.16.3.034502
Xiaoli Zhu, Hailiang Li, Leifeng Cao, Shenye Liu, Peixiong Shi, Changqing Xie
JM3 16(3), 034503 (19 August 2017) doi:10.1117/1.JMM.16.3.034503
Microelectromechanical systems (MEMS)
Mochtar Chandra, Shi-Yu Ke, Rongshun Chen, Cheng-Yao Lo
JM3 16(3), 035001 (20 July 2017) doi:10.1117/1.JMM.16.3.035001
TOPICS: Spatial resolution, Sensors, Capacitors, Device simulation, Detector development, Data analysis
Hao Qu, Huijun Yu, Bei Peng, Peng Peng, Hao Wang, Xiaoping He, Wu Zhou
JM3 16(3), 035002 (19 August 2017) doi:10.1117/1.JMM.16.3.035002
Back to Top