Special Section Guest Editorial: Challenges and Approaches to EUV-Based Patterning for High-Volume Manufacturing Applications
Self-aligned blocking integration demonstration for critical sub-30-nm pitch Mx level patterning with EUV self-aligned double patterning
Subresolution assist features impact and implementation in extreme ultraviolet lithography for next-generation beyond 7-nm node
Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?
Low-power three-degree-of-freedom Lorentz force microelectromechanical system mirror for optical applications