Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 18 · NO. 1 | January 2019
CONTENTS
Challenges and Approaches to EUV-Based Patterning for High-Volume Manufacturing Applications
J. Micro/Nanolith. MEMS MOEMS 18(1), 011001 (8 January 2019) https://doi.org/10.1117/1.JMM.18.1.011001
TOPICS: Optical lithography, Extreme ultraviolet, High volume manufacturing, Extreme ultraviolet lithography, Lithography, Photomasks, Roads, Photoresist technology, Plasma etching, Image processing
J. Micro/Nanolith. MEMS MOEMS 18(1), 011002 (31 July 2018) https://doi.org/10.1117/1.JMM.18.1.011002
TOPICS: Etching, Extreme ultraviolet, Line edge roughness, Optical lithography, Line width roughness, Silicon, Double patterning technology, Dielectrics, Metals, System on a chip
J. Micro/Nanolith. MEMS MOEMS 18(1), 011003 (31 July 2018) https://doi.org/10.1117/1.JMM.18.1.011003
TOPICS: SRAF, Photomasks, Metals, Extreme ultraviolet lithography, Personal protective equipment, Photovoltaics, Extreme ultraviolet, Image quality, Source mask optimization, Lithography
J. Micro/Nanolith. MEMS MOEMS 18(1), 011004 (31 July 2018) https://doi.org/10.1117/1.JMM.18.1.011004
TOPICS: Etching, Optical lithography, Extreme ultraviolet, Head-mounted displays, Silicon, Chemistry, Amorphous silicon, Argon, Polymers, Interfaces
J. Micro/Nanolith. MEMS MOEMS 18(1), 011005 (11 August 2018) https://doi.org/10.1117/1.JMM.18.1.011005
TOPICS: Photomasks, Nanoimprint lithography, Extreme ultraviolet, Phase shifts, Refractive index, Nickel, Ruthenium, Lithography, Reflectivity, Binary data
J. Micro/Nanolith. MEMS MOEMS 18(1), 011006 (5 September 2018) https://doi.org/10.1117/1.JMM.18.1.011006
TOPICS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography
J. Micro/Nanolith. MEMS MOEMS 18(1), 011007 (8 December 2018) https://doi.org/10.1117/1.JMM.18.1.011007
TOPICS: Nanoparticles, Photoresist materials, Extreme ultraviolet lithography, Oxides, Optical lithography, Lithography, Hafnium, Etching, Metals, Zirconium
Lithography
J. Micro/Nanolith. MEMS MOEMS 18(1), 013501 (14 January 2019) https://doi.org/10.1117/1.JMM.18.1.013501
TOPICS: Polarization, Extreme ultraviolet, Lithography, Photomasks, Diffraction gratings, Printing, Extreme ultraviolet lithography, Diffraction, Semiconducting wafers, Silicon
Microelectromechanical systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 18(1), 015001 (14 January 2019) https://doi.org/10.1117/1.JMM.18.1.015001
TOPICS: Mirrors, Micromirrors, Microelectromechanical systems, Magnetism, Actuators, Silicon, Semiconducting wafers, Finite element methods, Motion measurement, Electromagnetism
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