Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 19 · NO. 1 | January 2020
ISSUES IN PROGRESS
IN PROGRESS
SPIE publishes accepted journal articles as soon as they are approved for publication. Journal issues are considered In Progress until all articles for an issue have been published. Articles published ahead of the completed issue are fully citable.
Editorial
J. Micro/Nanolith. MEMS MOEMS 19(1), 010101 (12 February 2020) https://doi.org/10.1117/1.JMM.19.1.010101
TOPICS: Lithography, Heat treatments, Semiconductors, Metrology, Microelectromechanical systems, Microopto electromechanical systems
J. Micro/Nanolith. MEMS MOEMS 19(1), 010102 (20 January 2020) https://doi.org/10.1117/1.JMM.19.1.010102
TOPICS: Lithium, Microelectromechanical systems, Microopto electromechanical systems, Fluctuations and noise, Plutonium, Alternate lighting of surfaces
Lithography
J. Micro/Nanolith. MEMS MOEMS 19(1), 013501 (7 January 2020) https://doi.org/10.1117/1.JMM.19.1.013501
TOPICS: Polymers, Scanning probe lithography, Reflection, Nanolithography, Prototyping, Reflectivity, Diffraction gratings, Silicon, Optical lithography, Oxides
J. Micro/Nanolith. MEMS MOEMS 19(1), 013502 (22 February 2020) https://doi.org/10.1117/1.JMM.19.1.013502
TOPICS: Convolution, Process modeling, Photoresist materials, Optical simulations, Optical proximity correction, Source mask optimization, System on a chip, Printing, Photoresist processing, Geometrical optics
Metrology
J. Micro/Nanolith. MEMS MOEMS 19(1), 014001 (28 January 2020) https://doi.org/10.1117/1.JMM.19.1.014001
TOPICS: Diffraction, Scattering, X-rays, Diffraction gratings, Monte Carlo methods, Optical lithography, Metrology, Silicon, Sensors, Manufacturing
J. Micro/Nanolith. MEMS MOEMS 19(1), 014002 (30 January 2020) https://doi.org/10.1117/1.JMM.19.1.014002
TOPICS: Extreme ultraviolet, Carbon, Reticles, Inspection, Defect detection, Coherence imaging, Photomasks, Phase measurement, Reflectivity, Microscopes
Microelectromechanical systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 19(1), 015001 (20 February 2020) https://doi.org/10.1117/1.JMM.19.1.015001
TOPICS: Electrodes, Capacitors, Microelectromechanical systems, Capacitance, Silicon, Photomasks, Energy harvesting, Device simulation, Metals, Electromechanical design
J. Micro/Nanolith. MEMS MOEMS 19(1), 015002 (21 February 2020) https://doi.org/10.1117/1.JMM.19.1.015002
TOPICS: Microelectromechanical systems, Ferroelectric materials, Silicon, Error analysis, Semiconducting wafers, Reactive ion etching, Deep reactive ion etching, Actuators, Polishing, Motion models
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