Journal of Micro/Nanolithography, MEMS, and MOEMS

Editor-in-Chief: Chris A. Mack, Lithoguru.com, USA

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

Editorial Board
Editor-In-Chief

Lithoguru.com

USA

Senior Editors

ASML
USA

Topic: Lithography

National Cheng Kung Univ.
Taiwan

Topic: MEMS

KLA-Tencor
USA

Topics: Lithography and Metrology

Fraunhofer Inst. für Photonische Mikrosysteme
Germany

Topic: MOEMS

Univ. of North Carolina at Charlotte
USA

Topic: Microfabrication

Associate Editors

EUV Litho, Inc.
USA

IBM Corp., USA

The Molecular Foundry
USA

EMD Performance Materials
USA

Montana State University
USA

Hitachi High Technologies Corp.
Japan

ASML
USA

IMEC
Belgium

ASML
USA

Univ. of Central Florida
USA

Drexel Univ.
USA

National Univ. of Singapore
Singapore

National Tsing Hua University
Taiwan

IBM Corp.
USA

IBM Thomas J. Watson Research Center
USA

Univ. of California, Berkeley
USA

Tec-Start Consulting
USA

Drexel Univ.
USA

Nikon
Japan

Jet Propulsion Lab.
USA

Canon Nanotechnologies, Inc.
USA

IMEC
Belgium

National Institute of Standards and Technology
USA

Technische Univ. Ilmenau
Germany

Nikon Research Corp.
USA

Sandia National Laboratories
USA

I&I Consulting
USA

Pennsylvania State Univ.
USA

Univ. of Strathclyde
UK

ASML Brion Technologies
USA

Louisiana State Univ.
USA

Univ. of Freiburg
Germany

Past Editor

Burn Lin, Founding Editor, 2002-2011

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