Journal of Micro/Nanolithography, MEMS, and MOEMS

Co-Editors-in-Chief: 
Harry Levinson, HJL Lithography, USA
Hans Zappe, University of Freiburg, Germany

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM 3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies. In this context the electronics industry includes but is not limited to integrated circuits and multichip modules, and advanced packaging with features in the submicron regime.

On the cover: The figure is from the paper " Cascade and cluster of correlated reactions as causes of stochastic defects in exrtreme ultraviolet lithography" by Hiroshi Fukuda, from Vol. 19, Issue 2.

Editorial Board
Co-Editors-In-Chief

HJL Lithography

USA

University of Freiburg

Germany

Senior Editors

Eikonal, USA

IBM Corp., USA

ASML, USA

Korea Advanced Institute of Science and Technology, Republic of Korea

KLA Corp., USA

IBM Research - Almaden, USA

Fraunhofer Inst. für Photonische Mikrosysteme, Germany

Univ. of North Carolina at Charlotte, USA

Associate Editors

University of Frieburg
Germany

EUV Litho, Inc.
USA

KLA
USA

Mentor Graphics
USA

EMD Performance Materials
USA

IMEC
Belgium

Montana State University
USA

Hitachi High Technologies Corp.
Japan

IMEC
Belgium

ASML
USA

KLA
Belgium

PsiQuantum LLC
USA

Univ. of Central Florida
USA

National Univ. of Singapore
Singapore

National Tsing Hua University
Taiwan

Tokyo Electron Limited Technology Center America
USA

ASML
USA

Tec-Start Consulting
USA

Drexel Univ.
USA

École Polytechnique Fédérale de Lausanne
Switzerland

Canon Nanotechnologies, Inc.
USA

Zeiss
Germany

Outsight
Finland

IMEC
Belgium

Technische Univ. Ilmenau
Germany

Nikon Research Corp.
USA

I&I Consulting
USA

D2S Inc.
USA

Univ. of Strathclyde
UK

Louisiana State Univ.
USA

Past Editors

Burn Lin, Founding Editor, 2002-2011
Chris Mack, 2012-2019

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