Journal of Micro/Nanolithography, MEMS, and MOEMS

Co-Editors-in-Chief: 
Harry Levinson, HJL Lithography, USA
Hans Zappe, University of Freiburg, Germany

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM 3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

On the cover: The figure is from the paper "Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging" by Iacopo Mochi et al., from Vol. 19, Issue 1.

Editorial Board
Co-Editors-In-Chief

HJL Lithography

USA

University of Freiburg

Germany

Senior Editors

Eikonal, USA

IBM Corp., USA

ASML, USA

Korea Advanced Institute of Science and Technology, Republic of Korea

KLA Corp., USA

IBM Research - Almaden, USA

Fraunhofer Inst. für Photonische Mikrosysteme, Germany

Univ. of North Carolina at Charlotte, USA

Associate Editors

University of Frieburg
Germany

EUV Litho, Inc.
USA

KLA
USA

Mentor Graphics
USA

EMD Performance Materials
USA

IMEC
Belgium

Montana State University
USA

Hitachi High Technologies Corp.
Japan

IMEC
Belgium

ASML
USA

KLA
Belgium

PsiQuantum LLC
USA

Univ. of Central Florida
USA

National Univ. of Singapore
Singapore

National Tsing Hua University
Taiwan

Tokyo Electron Limited Technology Center America
USA

ASML
USA

Tec-Start Consulting
USA

Drexel Univ.
USA

École Polytechnique Fédérale de Lausanne
Switzerland

Canon Nanotechnologies, Inc.
USA

Zeiss
Germany

Outsight
Finland

IMEC
Belgium

Technische Univ. Ilmenau
Germany

Nikon Research Corp.
USA

I&I Consulting
USA

D2S Inc.
USA

Univ. of Strathclyde
UK

Louisiana State Univ.
USA

Past Editors

Burn Lin, Founding Editor, 2002-2011
Chris Mack, 2012-2019

Back to Top