journal of micro nanolithography mems and moems
VOL. 10 · NO. 1 | January 2011
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 10(1), 010101 (1 January 2011) doi:10.1117/1.3574901
TOPICS: Earthquakes, Safety
JM3 Letters
Dong Liu, Shakib Morshed, Bo Zhou, Barton Prorok, Soo-Young Lee
J. Micro/Nanolith. MEMS MOEMS 10(1), 010501 (1 January 2011) doi:10.1117/1.3563601
TOPICS: Silicon, Polymethylmethacrylate, Lithography, Nanolithography, Reactive ion etching, Etching, Electron beam lithography, Atomic force microscopy, Nanostructures, Scattering
Special Section on Theory and Practice of MEMS, NEMS, and MOEMS
J. Micro/Nanolith. MEMS MOEMS 10(1), 011501 (1 January 2011) doi:10.1117/1.3567190
TOPICS: Microelectromechanical systems, Microopto electromechanical systems, Nanoelectromechanical systems, Transducers, Nanotechnology, Materials science, Sensors, Actuators, Packaging, Nanolithography
Jo-Han Hsu, Max Ti-Kuang Hou, Rongshun Chen
J. Micro/Nanolith. MEMS MOEMS 10(1), 011502 (1 January 2011) doi:10.1117/1.3533325
TOPICS: Actuators, Seaborgium, Transistors, Sensors, Microfabrication, Sensing systems, Optical sensing, Numerical simulations, Mechanical engineering, Resolution enhancement technologies
Yoshimichi Ami, Hiroto Tachikawa, Naoki Takano, Norihisa Miki
J. Micro/Nanolith. MEMS MOEMS 10(1), 011503 (1 January 2011) doi:10.1117/1.3553393
TOPICS: Polymers, Photoresist materials, Manufacturing, Skin, Lithography, Electrodes, Photomasks, Near field diffraction, Ultraviolet radiation, Photoresist developing
Meng-Ju Lin, Kou-Wei Wu
J. Micro/Nanolith. MEMS MOEMS 10(1), 011504 (1 January 2011) doi:10.1117/1.3564031
TOPICS: Mirrors, Deformable mirrors, Electrodes, Electromechanical design, Photoresist materials, Aluminum, Annealing, Bulk micromachining, Reactive ion etching, Adaptive optics
Bo Liu, Zhiqiu Lv, Xunjun He, Yilong Hao, Zhihong Li
J. Micro/Nanolith. MEMS MOEMS 10(1), 011505 (1 January 2011) doi:10.1117/1.3564864
TOPICS: Switches, Microelectromechanical systems, Gold, Copper, Nickel, Resistance, Platinum, Switching, Surface micromachining, Scanning electron microscopy
Chien-Hung Lin, Rongshun Chen
J. Micro/Nanolith. MEMS MOEMS 10(1), 011506 (1 January 2011) doi:10.1117/1.3564881
TOPICS: Silicon, Nanoimprint lithography, Nanolithography, Electron beam lithography, Aluminum, Lithography, Etching, Semiconducting wafers, Photomasks, Dry etching
Qian Cheng Zhao, Zhen Chuan Yang, Zhong Yang Guo, Hai Tao Ding, Mo Li, Gui Zhen Yan
J. Micro/Nanolith. MEMS MOEMS 10(1), 011507 (1 January 2011) doi:10.1117/1.3565459
TOPICS: Gyroscopes, Packaging, Semiconducting wafers, Glasses, Microelectromechanical systems, Protactinium, Silicon, Wafer bonding, Titanium, Reliability
Articles
Fu-Li Hsiao, Chengkuo Lee
J. Micro/Nanolith. MEMS MOEMS 10(1), 013001 (1 January 2011) doi:10.1117/1.3532834
TOPICS: Resonators, Waveguides, Biosensing, Biosensors, Nanophotonics, Sensors, Silicon, Refractive index, Molecules, Microrings
J. Micro/Nanolith. MEMS MOEMS 10(1), 013002 (1 January 2011) doi:10.1117/1.3532835
TOPICS: Photomasks, Particles, Extreme ultraviolet lithography, Dielectrics, Electrodes, Quartz, Resistance, Dielectric polarization, Solids, Inspection
Shaw-Hwa Parng, Chih-Hsiu Yin, Kun-Feng Lee, Chuh-Suan Chen, Tsung-Che Chou, Horn-Chin Lee, Yuh-Jiuan Lin
J. Micro/Nanolith. MEMS MOEMS 10(1), 013003 (1 January 2011) doi:10.1117/1.3553432
TOPICS: Electrodes, Sensors, Glucose, Platinum, Glasses, Silver, Temperature metrology, Scanning electron microscopy, Polymeric sensors, Polymers
J. Micro/Nanolith. MEMS MOEMS 10(1), 013004 (1 January 2011) doi:10.1117/1.3533222
TOPICS: Photomasks, Model-based design, 3D modeling, Extreme ultraviolet, Optical proximity correction, Process modeling, Computer simulations, Projection lithography, Scanners, Extreme ultraviolet lithography
J. Micro/Nanolith. MEMS MOEMS 10(1), 013005 (1 January 2011) doi:10.1117/1.3533231
TOPICS: Extreme ultraviolet lithography, Photomasks, Lithography, Extreme ultraviolet, Manufacturing, Semiconducting wafers, Diffraction, Critical dimension metrology, Optical lithography, Lithographic illumination
J. Micro/Nanolith. MEMS MOEMS 10(1), 013006 (1 January 2011) doi:10.1117/1.3549736
TOPICS: Metrology, Calibration, Environmental sensing, Quality measurement, Manufacturing, Control systems, Data processing, Standards development, Measurement devices, Error analysis
J. Micro/Nanolith. MEMS MOEMS 10(1), 013007 (1 January 2011) doi:10.1117/1.3533324
TOPICS: Calibration, Photomasks, Data modeling, Critical dimension metrology, Extreme ultraviolet lithography, Extreme ultraviolet, 3D modeling, Scanning electron microscopy, Semiconducting wafers, Metrology
J. Micro/Nanolith. MEMS MOEMS 10(1), 013008 (1 January 2011) doi:10.1117/1.3541778
TOPICS: Source mask optimization, Photomasks, Diffractive optical elements, Semiconducting wafers, Scanners, Manufacturing, Double patterning technology, Fiber optic illuminators, Optical lithography, Lithographic illumination
J. Micro/Nanolith. MEMS MOEMS 10(1), 013009 (1 January 2011) doi:10.1117/1.3541779
TOPICS: Pellicles, Semiconducting wafers, Critical dimension metrology, Reticles, Apodization, Lithography, Photomasks, Transmittance, Optical proximity correction, Phase shifts
J. Micro/Nanolith. MEMS MOEMS 10(1), 013010 (1 January 2011) doi:10.1117/1.3541780
TOPICS: Critical dimension metrology, Atomic force microscopy, Scanning electron microscopy, Critical dimension scanning electron microscopy, Monte Carlo methods, Model-based design, Silicon, Statistical analysis, Cadmium, Image processing
Joong-Mok Park, Tae Geun Kim, Kristen Constant, Kai-Ming Ho
J. Micro/Nanolith. MEMS MOEMS 10(1), 013011 (1 January 2011) doi:10.1117/1.3541794
TOPICS: Photoresist materials, Holography, Copper, Metals, Polymers, Electrodes, Diffraction, Nanostructures, Nanolithography, Photomasks
Daisuke Hibino, Hiroyuki Shindo, Yuichi Abe, Yutaka Hojyo, Germain Fenger, Thuy Do, Ir Kusnadi, John Sturtevant, Jeroen Van de Kerkhove, Peter De Bisschop
J. Micro/Nanolith. MEMS MOEMS 10(1), 013012 (1 January 2011) doi:10.1117/1.3530082
TOPICS: Scanning electron microscopy, Optical proximity correction, Calibration, Image quality, Electron microscopes, Lithography, Semiconducting wafers, Critical dimension metrology, Optical alignment, Visualization
J. Micro/Nanolith. MEMS MOEMS 10(1), 013013 (1 January 2011) doi:10.1117/1.3532076
TOPICS: Overlay metrology, Semiconducting wafers, Metrology, Scanners, Critical dimension metrology, Birefringence, Distance measurement, Process control, Lithography, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 10(1), 013014 (1 January 2011) doi:10.1117/1.3545822
TOPICS: Transistors, Tolerancing, Lithography, Optical proximity correction, Critical dimension metrology, Device simulation, Logic, Error analysis, Digital electronics, Computer simulations
J. Micro/Nanolith. MEMS MOEMS 10(1), 013015 (1 January 2011) doi:10.1117/1.3549914
TOPICS: Calibration, Metrology, Atomic force microscope, Atomic force microscopy, Standards development, Error analysis, Interferometry, Scanners, Interferometers, Helium neon lasers
Shawn Chen, Chiawei Chang, Wensyang Hsu
J. Micro/Nanolith. MEMS MOEMS 10(1), 013016 (1 January 2011) doi:10.1117/1.3549920
TOPICS: Actuators, Nickel, Dielectrics, Distance measurement, Data modeling, Motion models, Electrodes, Optical lithography, Electroplating, Image processing
J. Micro/Nanolith. MEMS MOEMS 10(1), 013017 (1 January 2011) doi:10.1117/1.3555090
TOPICS: Extreme ultraviolet, Diffusion, Polymers, Data modeling, Line width roughness, Extreme ultraviolet lithography, Quantum efficiency, Absorbance, Silicon, Contamination
Meng Nie, Qing-An Huang, Hui-Yang Yu, Ming Qin, Wei-Hua Li
J. Micro/Nanolith. MEMS MOEMS 10(1), 013018 (1 January 2011) doi:10.1117/1.3555125
TOPICS: Sensors, Electrodes, Capacitors, Semiconductors, Capacitance, CMOS sensors, Etching, Metals, Silicon, Finite element methods
Novak Farrington, Stavros Iezekiel
J. Micro/Nanolith. MEMS MOEMS 10(1), 013019 (1 January 2011) doi:10.1117/1.3563599
TOPICS: Polishing, Surface finishing, Surface roughness, Micromachining, Photoresist developing, Scanning probe microscopy, Microelectromechanical systems, Multilayers, Particles, Photoresist materials
J. Micro/Nanolith. MEMS MOEMS 10(1), 013020 (1 January 2011) doi:10.1117/1.3565449
TOPICS: Manufacturing, Tolerancing, Optical proximity correction, Design for manufacturability, Failure analysis, Optics manufacturing, Capacitance, Optical calibration, Clocks, Lithography
J. Micro/Nanolith. MEMS MOEMS 10(1), 013021 (1 January 2011) doi:10.1117/1.3565466
TOPICS: Calibration, Silicon, Multilayers, Scanning electron microscopy, Diffraction gratings, Electron microscopes, Wet etching, Polishing, Surface finishing, Thin films
Errata
Ruixia Yang, Peng Gao, Huaibo Qu, Hanmin Tian
J. Micro/Nanolith. MEMS MOEMS 10(1), 019801 (1 January 2011) doi:10.1117/1.3562169
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