journal of micro nanolithography mems and moems
VOL. 1 · NO. 3 | October 2002
CONTENTS
Editorial
SPECIAL SECTION ON LITHOGRAPHY FOR SUB-100-NM DEVICE FABRICATION
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1507337
TOPICS: Lithography, Polarization, Photoresist processing, Image processing, Reflectivity, Interferometry, Reflection, Photoresist materials, Semiconducting wafers, Optics manufacturing
James Webb, Timothy Rich, Anthony Phillips, James Cornell
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1506373
TOPICS: Birefringence, Wavefronts, Crystals, Objectives, Imaging systems, Interferometry, Geometrical optics, Polarization, Combined lens-mirror systems, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1501565
TOPICS: Birefringence, Lithography, Monochromatic aberrations, Semiconducting wafers, Imaging systems, Resolution enhancement technologies, Reticles, Wavefronts, Photomasks, Computer aided design
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1503350
TOPICS: Birefringence, Crystals, Anisotropy, Polarization, Dielectrics, Wave propagation, Lithography, Ultraviolet radiation, UV optics, Refraction
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1502260
TOPICS: Liquids, Lithography, Immersion lithography, Semiconducting wafers, Resolution enhancement technologies, Wafer-level optics, Absorbance, Water, Refraction, Optical design
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1504458
TOPICS: Reticles, Lithography, Semiconducting wafers, Manufacturing, Optical lithography, Lithographic illumination, Resolution enhancement technologies, Opacity, Printing, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1503349
TOPICS: Photomasks, Lithography, Phase shifts, Image processing, Optical proximity correction, Semiconducting wafers, Optical lithography, Inspection, Binary data, System on a chip
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1506178
TOPICS: Photomasks, Diffraction, 3D modeling, Scattering, Electromagnetic simulation, Near field, Polarization, Computer simulations, Optical proximity correction, Electromagnetism
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1507335
TOPICS: Photoresist materials, Lithography, Photoresist developing, Optical lithography, Semiconductors, Deep ultraviolet, Near ultraviolet, Photoresist processing, Binary data, Glasses
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1507336
TOPICS: Reactive ion etching, Silicon, Photoresist processing, Lithography, Fluorine, Reflectivity, Interfaces, Photomasks, Optical lithography, Etching
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1508410
TOPICS: Lithography, Scanning electron microscopy, Glasses, Printing, Overlay metrology, Distortion, Chromium, Photomasks, Solids, Defect inspection
Vivek Singh, Jorge Garcia-Colevatti
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1508411
TOPICS: Computer aided design, TCAD, Optical proximity correction, Lithography, Solid modeling, Integrated circuits, Integrated circuit design, Product engineering, Performance modeling, Photoresist materials
RESOLUTION ENHANCEMENT TECHNIQUES
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1502261
TOPICS: Diffraction, Printing, Photomasks, Phase shifts, Lithographic illumination, Visualization, Monochromatic aberrations, Lithography, Optical lithography, Resolution enhancement technologies
PHOTOMASKS
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1503806
TOPICS: Reticles, Calibration, Artificial intelligence, Optical lithography, Shape analysis, Semiconducting wafers, Distortion, Monochromatic aberrations, Projection systems, Differential equations
IMAGING SYSTEMS
Takaharu Miura, Tatsuo Sato, Masaya Miyazaki, Kazunari Hada, Yu Sato, Masateru Tokunaga, Yukio Kakizaki
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1504101
TOPICS: Electron beams, Semiconducting wafers, Magnetism, Electron beam lithography, Reticles, Projection lithography, Metrology, Control systems, Data modeling, Optical lithography
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