Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 1 · NO. 3 | October 2002
CONTENTS
Editorial
SPECIAL SECTION ON LITHOGRAPHY FOR SUB-100-NM DEVICE FABRICATION
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1507337
TOPICS: Lithography, Polarization, Photoresist processing, Image processing, Reflectivity, Interferometry, Reflection, Photoresist materials, Semiconducting wafers, Optics manufacturing
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1506373
TOPICS: Birefringence, Wavefronts, Crystals, Objectives, Imaging systems, Interferometry, Geometrical optics, Polarization, Combined lens-mirror systems, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1501565
TOPICS: Birefringence, Lithography, Monochromatic aberrations, Semiconducting wafers, Imaging systems, Resolution enhancement technologies, Reticles, Wavefronts, Photomasks, Computer aided design
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1503350
TOPICS: Birefringence, Crystals, Anisotropy, Polarization, Dielectrics, Wave propagation, Lithography, Ultraviolet radiation, UV optics, Refraction
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1502260
TOPICS: Liquids, Lithography, Immersion lithography, Semiconducting wafers, Resolution enhancement technologies, Wafer-level optics, Absorbance, Water, Refraction, Optical design
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1504458
TOPICS: Reticles, Lithography, Semiconducting wafers, Manufacturing, Optical lithography, Lithographic illumination, Resolution enhancement technologies, Opacity, Printing, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1503349
TOPICS: Photomasks, Lithography, Phase shifts, Image processing, Optical proximity correction, Semiconducting wafers, Optical lithography, Inspection, Binary data, System on a chip
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1506178
TOPICS: Photomasks, Diffraction, 3D modeling, Scattering, Electromagnetic simulation, Near field, Polarization, Computer simulations, Optical proximity correction, Electromagnetism
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1507335
TOPICS: Photoresist materials, Lithography, Photoresist developing, Optical lithography, Semiconductors, Deep ultraviolet, Near ultraviolet, Photoresist processing, Binary data, Glasses
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1507336
TOPICS: Reactive ion etching, Silicon, Photoresist processing, Lithography, Fluorine, Reflectivity, Interfaces, Photomasks, Optical lithography, Etching
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1508410
TOPICS: Lithography, Scanning electron microscopy, Glasses, Printing, Overlay metrology, Distortion, Chromium, Photomasks, Solids, Defect inspection
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1508411
TOPICS: Computer aided design, TCAD, Optical proximity correction, Lithography, Solid modeling, Integrated circuits, Integrated circuit design, Product engineering, Performance modeling, Photoresist materials
RESOLUTION ENHANCEMENT TECHNIQUES
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1502261
TOPICS: Diffraction, Printing, Photomasks, Phase shifts, Lithographic illumination, Visualization, Monochromatic aberrations, Lithography, Optical lithography, Resolution enhancement technologies
PHOTOMASKS
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1503806
TOPICS: Reticles, Calibration, Artificial intelligence, Optical lithography, Shape analysis, Semiconducting wafers, Distortion, Monochromatic aberrations, Projection systems, Differential equations
IMAGING SYSTEMS
J. Micro/Nanolith. MEMS MOEMS 1(3), (1 October 2002) https://doi.org/10.1117/1.1504101
TOPICS: Electron beams, Semiconducting wafers, Magnetism, Electron beam lithography, Reticles, Projection lithography, Metrology, Control systems, Data modeling, Optical lithography
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