Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 10 · NO. 2 | April 2011
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (14)
Errata (2)
Editorial
J. Micro/Nanolith. MEMS MOEMS 10(2), 020101 (1 April 2011) https://doi.org/10.1117/1.3601751
TOPICS: Lithography, Optical lithography, Software development, Computer simulations, Electrical engineering, Chemical engineering, Defense and security, Helium, Physics, Chemistry
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 10(2), 020501 (1 April 2011) https://doi.org/10.1117/1.3580751
TOPICS: Sensors, Glasses, Microelectromechanical systems, Iridium, Gold, Electrodes, Etching, Oxides, Semiconducting wafers, Oxygen
Articles
J. Micro/Nanolith. MEMS MOEMS 10(2), 023001 (1 April 2011) https://doi.org/10.1117/1.3574117
TOPICS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Reflectivity, Deep ultraviolet, Lithography, Semiconducting wafers, Reticles, Visible radiation
J. Micro/Nanolith. MEMS MOEMS 10(2), 023002 (1 April 2011) https://doi.org/10.1117/1.3574143
J. Micro/Nanolith. MEMS MOEMS 10(2), 023003 (1 April 2011) https://doi.org/10.1117/1.3574771
TOPICS: Scanning electron microscopy, Image filtering, Critical dimension metrology, Nonlinear filtering, Electron microscopes, Image processing, Speckle, Photomasks, Digital filtering, Anisotropic filtering
J. Micro/Nanolith. MEMS MOEMS 10(2), 023004 (1 April 2011) https://doi.org/10.1117/1.3580755
TOPICS: Etching, Gallium arsenide, Sensors, Plasma, Staring arrays, Plasma etching, Reactive ion etching, Ions, Semiconducting wafers, Quantum well infrared photodetectors
J. Micro/Nanolith. MEMS MOEMS 10(2), 023005 (1 April 2011) https://doi.org/10.1117/1.3574129
TOPICS: Mirrors, Microopto electromechanical systems, Monochromatic aberrations, Deformable mirrors, Microscopy, Electrodes, Control systems, Semiconducting wafers, Imaging systems, Aluminum
J. Micro/Nanolith. MEMS MOEMS 10(2), 023006 (1 April 2011) https://doi.org/10.1117/1.3574136
TOPICS: Etching, Silicon, Reactive ion etching, Plasma, Polymers, Ions, Micro optics, Plasma etching, Scanning electron microscopy, Polymer thin films
J. Micro/Nanolith. MEMS MOEMS 10(2), 023007 (1 April 2011) https://doi.org/10.1117/1.3586797
TOPICS: Optical lithography, Binary data, Phase shifts, Imaging systems, Photomasks, Computer simulations, Lithography, Coherence imaging, Algorithm development, Systems modeling
J. Micro/Nanolith. MEMS MOEMS 10(2), 023008 (1 April 2011) https://doi.org/10.1117/1.3589305
TOPICS: Liquids, Interfaces, Photomasks, Water, Optical lithography, Velocity measurements, Lithography, Microfluidics, Computer simulations, Numerical simulations
J. Micro/Nanolith. MEMS MOEMS 10(2), 023009 (1 April 2011) https://doi.org/10.1117/1.3590252
TOPICS: Photomasks, Manufacturing, Optical lithography, Resolution enhancement technologies, Optics manufacturing, Optimization (mathematics), Imaging systems, Optical proximity correction, Lithium, Image resolution
J. Micro/Nanolith. MEMS MOEMS 10(2), 023010 (1 April 2011) https://doi.org/10.1117/1.3598169
TOPICS: Line width roughness, Edge detection, Nano opto mechanical systems, Scanning electron microscopy, Statistical analysis, Line edge roughness, Error analysis, Monte Carlo methods, Electron microscopes, Interference (communication)
J. Micro/Nanolith. MEMS MOEMS 10(2), 023011 (1 April 2011) https://doi.org/10.1117/1.3590939
TOPICS: Sensors, Microlens, Superconductors, Quartz, Microlens array, Infrared sensors, Photoresist materials, Infrared radiation, Thin films, Black bodies
J. Micro/Nanolith. MEMS MOEMS 10(2), 023012 (1 April 2011) https://doi.org/10.1117/1.3599077
TOPICS: Photomasks, Line edge roughness, Extreme ultraviolet lithography, Metrology, Stochastic processes, Extreme ultraviolet, Lithography, Diffraction, Photoresist processing, Data modeling
J. Micro/Nanolith. MEMS MOEMS 10(2), 023013 (1 April 2011) https://doi.org/10.1117/1.3599858
TOPICS: Double patterning technology, Reflectivity, Photomasks, Nanoimprint lithography, Lithography, Semiconducting wafers, Image processing, Photoresist processing, Computer aided design, Logic
J. Micro/Nanolith. MEMS MOEMS 10(2), 023014 (1 April 2011) https://doi.org/10.1117/1.3599867
TOPICS: Overlay metrology, Scanning electron microscopy, Double patterning technology, Electron microscopes, Data modeling, Semiconducting wafers, Optical lithography, Lithography, Error analysis, Wafer-level optics
COMMUNICATIONS
J. Micro/Nanolith. MEMS MOEMS 10(2), 029701 (1 April 2011) https://doi.org/10.1117/1.3586798
TOPICS: Chemical species, Etching, Anisotropic etching, Silicon, Wet etching, Crystals, Microelectromechanical systems, Monte Carlo methods, Computer simulations, Fabrication
Errata
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