journal of micro nanolithography mems and moems
VOL. 10 · NO. 2 | April 2011
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (14)
Errata (2)
Editorial
J. Micro/Nanolith. MEMS MOEMS 10(2), 020101 (1 April 2011) https://doi.org/10.1117/1.3601751
TOPICS: Lithography, Optical lithography, Software development, Computer simulations, Electrical engineering, Chemical engineering, Defense and security, Helium, Physics, Chemistry
JM3 Letters
Woo-Hyuck Choi, Ian Papautsky
J. Micro/Nanolith. MEMS MOEMS 10(2), 020501 (1 April 2011) https://doi.org/10.1117/1.3580751
TOPICS: Sensors, Glasses, Microelectromechanical systems, Iridium, Gold, Electrodes, Etching, Oxides, Semiconducting wafers, Oxygen
Articles
J. Micro/Nanolith. MEMS MOEMS 10(2), 023001 (1 April 2011) https://doi.org/10.1117/1.3574117
TOPICS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Reflectivity, Deep ultraviolet, Lithography, Semiconducting wafers, Reticles, Visible radiation
J. Micro/Nanolith. MEMS MOEMS 10(2), 023002 (1 April 2011) https://doi.org/10.1117/1.3574143
Wonsuk Lee, Sang Hyun Han, Hong Jeong
J. Micro/Nanolith. MEMS MOEMS 10(2), 023003 (1 April 2011) https://doi.org/10.1117/1.3574771
TOPICS: Scanning electron microscopy, Image filtering, Critical dimension metrology, Nonlinear filtering, Electron microscopes, Image processing, Speckle, Photomasks, Digital filtering, Anisotropic filtering
J. Micro/Nanolith. MEMS MOEMS 10(2), 023004 (1 April 2011) https://doi.org/10.1117/1.3580755
TOPICS: Etching, Gallium arsenide, Sensors, Plasma, Staring arrays, Plasma etching, Reactive ion etching, Ions, Semiconducting wafers, Quantum well infrared photodetectors
Mohammad Moghimi, B. Jeffrey Lutzenberger, Brant Kaylor, David Dickensheets
J. Micro/Nanolith. MEMS MOEMS 10(2), 023005 (1 April 2011) https://doi.org/10.1117/1.3574129
TOPICS: Mirrors, Microopto electromechanical systems, Monochromatic aberrations, Deformable mirrors, Microscopy, Electrodes, Control systems, Semiconducting wafers, Imaging systems, Aluminum
J. Micro/Nanolith. MEMS MOEMS 10(2), 023006 (1 April 2011) https://doi.org/10.1117/1.3574136
TOPICS: Etching, Silicon, Reactive ion etching, Plasma, Polymers, Ions, Micro optics, Plasma etching, Scanning electron microscopy, Polymer thin films
Shiyuan Liu, Wei Liu, Tingting Zhou
J. Micro/Nanolith. MEMS MOEMS 10(2), 023007 (1 April 2011) https://doi.org/10.1117/1.3586797
TOPICS: Optical lithography, Binary data, Phase shifts, Imaging systems, Photomasks, Computer simulations, Lithography, Coherence imaging, Algorithm development, Systems modeling
Ashish Mall, Amit Agrawal, Ramesh Singh, Suhas Joshi
J. Micro/Nanolith. MEMS MOEMS 10(2), 023008 (1 April 2011) https://doi.org/10.1117/1.3589305
TOPICS: Liquids, Interfaces, Photomasks, Water, Optical lithography, Velocity measurements, Lithography, Microfluidics, Computer simulations, Numerical simulations
J. Micro/Nanolith. MEMS MOEMS 10(2), 023009 (1 April 2011) https://doi.org/10.1117/1.3590252
TOPICS: Photomasks, Manufacturing, Optical lithography, Resolution enhancement technologies, Optics manufacturing, Optimization (mathematics), Imaging systems, Optical proximity correction, Lithium, Image resolution
Atsushi Hiraiwa, Akio Nishida
J. Micro/Nanolith. MEMS MOEMS 10(2), 023010 (1 April 2011) https://doi.org/10.1117/1.3598169
TOPICS: Line width roughness, Edge detection, Nano opto mechanical systems, Scanning electron microscopy, Statistical analysis, Line edge roughness, Error analysis, Monte Carlo methods, Electron microscopes, Interference (communication)
Xinyu Zhang, Hui Li, Kan Liu, Jun Luo, Chang-Sheng Xie, An Ji, Tianxu Zhang
J. Micro/Nanolith. MEMS MOEMS 10(2), 023011 (1 April 2011) https://doi.org/10.1117/1.3590939
TOPICS: Sensors, Microlens, Superconductors, Quartz, Microlens array, Infrared sensors, Photoresist materials, Infrared radiation, Thin films, Black bodies
J. Micro/Nanolith. MEMS MOEMS 10(2), 023012 (1 April 2011) https://doi.org/10.1117/1.3599077
TOPICS: Photomasks, Line edge roughness, Extreme ultraviolet lithography, Metrology, Stochastic processes, Extreme ultraviolet, Lithography, Diffraction, Photoresist processing, Data modeling
J. Micro/Nanolith. MEMS MOEMS 10(2), 023013 (1 April 2011) https://doi.org/10.1117/1.3599858
TOPICS: Double patterning technology, Reflectivity, Photomasks, Nanoimprint lithography, Lithography, Semiconducting wafers, Image processing, Photoresist processing, Computer aided design, Logic
Shoji Hotta, Takumichi Sutani, Scott Halle, Daniel Moore, Chas Archie, Akiyuki Sugiyama, Masahiko Ikeno, Atsuko Yamaguchi, Kazuyoshi Torii
J. Micro/Nanolith. MEMS MOEMS 10(2), 023014 (1 April 2011) https://doi.org/10.1117/1.3599867
TOPICS: Overlay metrology, Scanning electron microscopy, Double patterning technology, Electron microscopes, Data modeling, Semiconducting wafers, Optical lithography, Lithography, Error analysis, Wafer-level optics
COMMUNICATIONS
Mohsen Shayan, Amir Reza Merati, Behrooz Arezoo, Mohamad Amin Rezvankhah
J. Micro/Nanolith. MEMS MOEMS 10(2), 029701 (1 April 2011) https://doi.org/10.1117/1.3586798
TOPICS: Chemical species, Etching, Anisotropic etching, Silicon, Wet etching, Crystals, Microelectromechanical systems, Monte Carlo methods, Computer simulations, Fabrication
Errata
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