Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 10 · NO. 3 | July 2011
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (21)
Editorial
J. Micro/Nanolith. MEMS MOEMS 10(3), 030101 (1 July 2011) https://doi.org/10.1117/1.3643281
TOPICS: Iterated function systems
Review Articles
J. Micro/Nanolith. MEMS MOEMS 10(3), 032001 (1 July 2011) https://doi.org/10.1117/1.3642641
TOPICS: Nanoimprint lithography, Semiconductors, Manufacturing, Lithography, Inspection, Overlay metrology, Beam propagation method, Semiconducting wafers, Line width roughness, Optical alignment
Articles
J. Micro/Nanolith. MEMS MOEMS 10(3), 033001 (1 July 2011) https://doi.org/10.1117/1.3603992
TOPICS: Etching, Line width roughness, Semiconducting wafers, Photoresist processing, Optical lithography, Line edge roughness, Extreme ultraviolet, Plasma, Ion beams, Liquids
J. Micro/Nanolith. MEMS MOEMS 10(3), 033002 (1 July 2011) https://doi.org/10.1117/1.3609043
TOPICS: Plasma, Extreme ultraviolet, Gas lasers, Carbon monoxide, Tin, Laser energy, Absorption, Photon transport, Pulsed laser operation, Nd:YAG lasers
J. Micro/Nanolith. MEMS MOEMS 10(3), 033003 (1 July 2011) https://doi.org/10.1117/1.3607424
TOPICS: Polarization, Diffraction, Photomasks, Source mask optimization, Optical proximity correction, Nanoimprint lithography, Lithography, Image acquisition, Phase shifts, Light
J. Micro/Nanolith. MEMS MOEMS 10(3), 033004 (1 July 2011) https://doi.org/10.1117/1.3607429
TOPICS: Data modeling, Extreme ultraviolet, Diffusion, Stochastic processes, Line width roughness, Extreme ultraviolet lithography, Polymers, Absorption, Solids, Critical dimension metrology
J. Micro/Nanolith. MEMS MOEMS 10(3), 033005 (1 July 2011) https://doi.org/10.1117/1.3606577
TOPICS: Light emitting diodes, Binary data, Packaging, LED lighting, Light sources, Light sources and illumination, Light, Receivers, Lens design, Microlens
J. Micro/Nanolith. MEMS MOEMS 10(3), 033006 (1 July 2011) https://doi.org/10.1117/1.3609230
TOPICS: Mirrors, Microopto electromechanical systems, Control systems, Scanners, Computer programming, Diodes, Electronics, Sensors, Photodiodes, Microelectromechanical systems
J. Micro/Nanolith. MEMS MOEMS 10(3), 033007 (1 July 2011) https://doi.org/10.1117/1.3610168
TOPICS: High dynamic range imaging, 3D metrology, Digital micromirror devices, Cameras, Metrology, Dynamical systems, Light emitting diodes, Mirrors, Collimation, Prisms
J. Micro/Nanolith. MEMS MOEMS 10(3), 033008 (1 July 2011) https://doi.org/10.1117/1.3616023
TOPICS: Fourier transforms, Line width roughness, Statistical analysis, Error analysis, Solids, Line edge roughness, Photoresist materials, Metrology, Extreme ultraviolet lithography, Transistors
J. Micro/Nanolith. MEMS MOEMS 10(3), 033009 (1 July 2011) https://doi.org/10.1117/1.3616067
TOPICS: Extreme ultraviolet, Lithography, Polymers, Diffusion, Line width roughness, Extreme ultraviolet lithography, Absorption, Chemically amplified resists, Yield improvement, Etching
J. Micro/Nanolith. MEMS MOEMS 10(3), 033010 (1 July 2011) https://doi.org/10.1117/1.3616043
TOPICS: Process modeling, Photomasks, Optical proximity correction, 3D modeling, Model-based design, Image processing, Image segmentation, 3D image processing, Data modeling, Computer simulations
J. Micro/Nanolith. MEMS MOEMS 10(3), 033011 (1 July 2011) https://doi.org/10.1117/1.3616060
TOPICS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Reflectivity, Tin, Binary data, Etching, Semiconducting wafers, Reflection, Signal attenuation
J. Micro/Nanolith. MEMS MOEMS 10(3), 033012 (1 July 2011) https://doi.org/10.1117/1.3624516
TOPICS: Prisms, Plasmonics, Mirrors, Interfaces, Photoresist materials, Lithography, Reflectivity, YAG lasers, Reflection, Sodium
J. Micro/Nanolith. MEMS MOEMS 10(3), 033013 (1 July 2011) https://doi.org/10.1117/1.3624515
TOPICS: Thin films, Actuators, Liquids, Silicon, Electrodes, Copper, Multilayers, Finite element methods, Sputter deposition, Protactinium
J. Micro/Nanolith. MEMS MOEMS 10(3), 033014 (1 July 2011) https://doi.org/10.1117/1.3625606
TOPICS: Ultraviolet radiation, Fluctuations and noise, Lithography, Photomasks, Semiconducting wafers, Coating, Scanning electron microscopy, 3D microstructuring, Optical alignment, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 10(3), 033015 (1 July 2011) https://doi.org/10.1117/1.3624517
TOPICS: Silicon, Etching, Spiral phase plates, Solids, Antireflective coatings, Diffraction, Wavefronts, Plasma etching, Optical design, Image resolution
J. Micro/Nanolith. MEMS MOEMS 10(3), 033016 (1 July 2011) https://doi.org/10.1117/1.3625633
TOPICS: Photoresist materials, Image processing, Metals, Photomasks, Microelectromechanical systems, Silicon, Etching, Aluminum, Ultraviolet radiation, Titanium
J. Micro/Nanolith. MEMS MOEMS 10(3), 033017 (1 July 2011) https://doi.org/10.1117/1.3626852
TOPICS: Overlay metrology, Polarimetry, Error analysis, Silicon, Semiconducting wafers, Metrology, Optical testing, Microscopes, Critical dimension metrology, Mueller matrices
J. Micro/Nanolith. MEMS MOEMS 10(3), 033018 (1 July 2011) https://doi.org/10.1117/1.3625635
TOPICS: Photomasks, Particles, Lithography, Semiconducting wafers, Nickel, Photoresist processing, Inspection, Contamination, Wafer inspection, Defect inspection
J. Micro/Nanolith. MEMS MOEMS 10(3), 033019 (1 July 2011) https://doi.org/10.1117/1.3631753
TOPICS: Stochastic processes, Extreme ultraviolet lithography, Extreme ultraviolet, Monte Carlo methods, Absorption, Photoresist materials, Quantum efficiency, Ionization, Line edge roughness, Statistical modeling
J. Micro/Nanolith. MEMS MOEMS 10(3), 033020 (1 July 2011) https://doi.org/10.1117/1.3639188
TOPICS: Optical filters, Coating, Image filtering, Imaging systems, Multispectral imaging, Optical sensors, Adhesives, Spatial resolution, Photomasks, Photoresist materials
J. Micro/Nanolith. MEMS MOEMS 10(3), 033021 (1 July 2011) https://doi.org/10.1117/1.3633246
TOPICS: Photomasks, Reticles, Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet lithography, Manufacturing, Lithography, Inspection, Extreme ultraviolet, Data modeling
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