journal of micro nanolithography mems and moems
VOL. 10 · NO. 3 | July 2011
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (21)
Editorial
J. Micro/Nanolith. MEMS MOEMS 10(3), 030101 (1 July 2011) doi:10.1117/1.3643281
TOPICS: Iterated function systems
Review Articles
J. Micro/Nanolith. MEMS MOEMS 10(3), 032001 (1 July 2011) doi:10.1117/1.3642641
TOPICS: Nanoimprint lithography, Semiconductors, Manufacturing, Lithography, Inspection, Overlay metrology, Beam propagation method, Semiconducting wafers, Line width roughness, Optical alignment
Articles
J. Micro/Nanolith. MEMS MOEMS 10(3), 033001 (1 July 2011) doi:10.1117/1.3603992
TOPICS: Etching, Line width roughness, Semiconducting wafers, Photoresist processing, Optical lithography, Line edge roughness, Extreme ultraviolet, Plasma, Ion beams, Liquids
J. Micro/Nanolith. MEMS MOEMS 10(3), 033002 (1 July 2011) doi:10.1117/1.3609043
TOPICS: Plasma, Extreme ultraviolet, Gas lasers, Carbon monoxide, Tin, Laser energy, Absorption, Photon transport, Pulsed laser operation, Nd:YAG lasers
J. Micro/Nanolith. MEMS MOEMS 10(3), 033003 (1 July 2011) doi:10.1117/1.3607424
TOPICS: Polarization, Diffraction, Photomasks, Source mask optimization, Optical proximity correction, Nanoimprint lithography, Lithography, Image acquisition, Phase shifts, Light
J. Micro/Nanolith. MEMS MOEMS 10(3), 033004 (1 July 2011) doi:10.1117/1.3607429
TOPICS: Data modeling, Extreme ultraviolet, Diffusion, Stochastic processes, Line width roughness, Extreme ultraviolet lithography, Polymers, Absorption, Solids, Critical dimension metrology
Chi-Chang Hsieh, Pa-Yee Tsai, Yan-Huei Li, Cheng-Wen Fan
J. Micro/Nanolith. MEMS MOEMS 10(3), 033005 (1 July 2011) doi:10.1117/1.3606577
TOPICS: Light emitting diodes, Binary data, Packaging, LED lighting, Light sources, Light sources and illumination, Light, Receivers, Lens design, Microlens
J. Micro/Nanolith. MEMS MOEMS 10(3), 033006 (1 July 2011) doi:10.1117/1.3609230
TOPICS: Mirrors, Microopto electromechanical systems, Control systems, Scanners, Computer programming, Diodes, Electronics, Sensors, Photodiodes, Microelectromechanical systems
Daniel Härter, Claas Müller, Holger Reinecke
J. Micro/Nanolith. MEMS MOEMS 10(3), 033007 (1 July 2011) doi:10.1117/1.3610168
TOPICS: High dynamic range imaging, 3D metrology, Digital micromirror devices, Cameras, Metrology, Dynamical systems, Light emitting diodes, Mirrors, Collimation, Prisms
Atsushi Hiraiwa, Akio Nishida
J. Micro/Nanolith. MEMS MOEMS 10(3), 033008 (1 July 2011) doi:10.1117/1.3616023
TOPICS: Fourier transforms, Line width roughness, Statistical analysis, Error analysis, Solids, Line edge roughness, Photoresist materials, Metrology, Extreme ultraviolet lithography, Transistors
J. Micro/Nanolith. MEMS MOEMS 10(3), 033009 (1 July 2011) doi:10.1117/1.3616067
TOPICS: Extreme ultraviolet, Lithography, Polymers, Diffusion, Line width roughness, Extreme ultraviolet lithography, Absorption, Chemically amplified resists, Yield improvement, Etching
J. Micro/Nanolith. MEMS MOEMS 10(3), 033010 (1 July 2011) doi:10.1117/1.3616043
TOPICS: Process modeling, Photomasks, Optical proximity correction, 3D modeling, Model-based design, Image processing, Image segmentation, 3D image processing, Data modeling, Computer simulations
J. Micro/Nanolith. MEMS MOEMS 10(3), 033011 (1 July 2011) doi:10.1117/1.3616060
TOPICS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Reflectivity, Tin, Binary data, Etching, Semiconducting wafers, Reflection, Signal attenuation
J. Micro/Nanolith. MEMS MOEMS 10(3), 033012 (1 July 2011) doi:10.1117/1.3624516
TOPICS: Prisms, Plasmonics, Mirrors, Interfaces, Photoresist materials, Lithography, Reflectivity, YAG lasers, Reflection, Sodium
J. Micro/Nanolith. MEMS MOEMS 10(3), 033013 (1 July 2011) doi:10.1117/1.3624515
TOPICS: Thin films, Actuators, Liquids, Silicon, Electrodes, Copper, Multilayers, Finite element methods, Sputter deposition, Protactinium
Hamed Keramati, Jianmin Miao, Weng Kong Chan
J. Micro/Nanolith. MEMS MOEMS 10(3), 033014 (1 July 2011) doi:10.1117/1.3625606
TOPICS: Ultraviolet radiation, Fluctuations and noise, Lithography, Photomasks, Semiconducting wafers, Coating, Scanning electron microscopy, 3D microstructuring, Optical alignment, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 10(3), 033015 (1 July 2011) doi:10.1117/1.3624517
TOPICS: Silicon, Etching, Spiral phase plates, Solids, Antireflective coatings, Diffraction, Wavefronts, Plasma etching, Optical design, Image resolution
Scott Ostrow, Ronald Coutu
J. Micro/Nanolith. MEMS MOEMS 10(3), 033016 (1 July 2011) doi:10.1117/1.3625633
TOPICS: Photoresist materials, Image processing, Metals, Photomasks, Microelectromechanical systems, Silicon, Etching, Aluminum, Ultraviolet radiation, Titanium
J. Micro/Nanolith. MEMS MOEMS 10(3), 033017 (1 July 2011) doi:10.1117/1.3626852
TOPICS: Overlay metrology, Polarimetry, Error analysis, Silicon, Semiconducting wafers, Metrology, Optical testing, Microscopes, Critical dimension metrology, Mueller matrices
Lovejeet Singh, Kang Luo, Zhengmao Ye, Frank Xu, Gaddi Haase, David Curran, Dwayne LaBrake, Douglas Resnick, S. Sreenivasan
J. Micro/Nanolith. MEMS MOEMS 10(3), 033018 (1 July 2011) doi:10.1117/1.3625635
TOPICS: Photomasks, Particles, Lithography, Semiconducting wafers, Nickel, Photoresist processing, Inspection, Contamination, Wafer inspection, Defect inspection
J. Micro/Nanolith. MEMS MOEMS 10(3), 033019 (1 July 2011) doi:10.1117/1.3631753
TOPICS: Stochastic processes, Extreme ultraviolet lithography, Extreme ultraviolet, Monte Carlo methods, Absorption, Photoresist materials, Quantum efficiency, Ionization, Line edge roughness, Statistical modeling
Dingrong Yi, Linghua Kong
J. Micro/Nanolith. MEMS MOEMS 10(3), 033020 (1 July 2011) doi:10.1117/1.3639188
TOPICS: Optical filters, Coating, Image filtering, Imaging systems, Multispectral imaging, Optical sensors, Adhesives, Spatial resolution, Photomasks, Photoresist materials
J. Micro/Nanolith. MEMS MOEMS 10(3), 033021 (1 July 2011) doi:10.1117/1.3633246
TOPICS: Photomasks, Reticles, Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet lithography, Manufacturing, Lithography, Inspection, Extreme ultraviolet, Data modeling
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