journal of micro nanolithography mems and moems
VOL. 10 · NO. 4 | October 2011
CONTENTS
IN THIS ISSUE

Editorial (1)
Articles (17)
Errata (1)
Editorial
J. Micro/Nanolith. MEMS MOEMS 10(4), 040101 (1 October 2011) https://doi.org/10.1117/1.3665263
TOPICS: Microelectromechanical systems, Microopto electromechanical systems, Microfabrication, Logic, Manufacturing, Optical lithography, Microsystems, Lithography, Semiconductors, Immersion lithography
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 10(4), 040501 (1 October 2011) https://doi.org/10.1117/1.3663567
TOPICS: Fourier transforms, Stochastic processes, Metrology, Correlation function, 3D metrology, Lithography, 3D modeling, Spherical lenses, Data modeling, Line edge roughness
Articles
Tenghsien Lai, Chingfu Tsou
J. Micro/Nanolith. MEMS MOEMS 10(4), 043001 (1 October 2011) https://doi.org/10.1117/1.3641412
TOPICS: Microactuators, Electromagnetism, Magnetism, Packaging, Silicon, Nickel, Mirrors, Chemical oxygen iodine lasers, Thermal effects, Electroplating
Jalal Rouhi, Shahrom Mahmud, Sabar Hutagalung, Saeid Kakooei
J. Micro/Nanolith. MEMS MOEMS 10(4), 043002 (1 October 2011) https://doi.org/10.1117/1.3643480
TOPICS: Nanolithography, Electrodes, Scanning probe microscopy, Silicon, Photomasks, Oxides, Fabrication, Lithography, Transistors, Oxidation
Christopher Bencher, Jo Finders, Ilan Englard, Yaron Cohen, Amir Sagiv, Michael Ben-Yishai, Shmoolik Mangan, Huixiong Dai, Chris Ngai, Kfir Dotan, Roel Knops, Orion Mouraille, Evert Mos, Alexander Kremer
J. Micro/Nanolith. MEMS MOEMS 10(4), 043003 (1 October 2011) https://doi.org/10.1117/1.3641409
TOPICS: Photomasks, Semiconducting wafers, Critical dimension metrology, Lithography, Metrology, Inspection, Scanners, Optimization (mathematics), Double patterning technology, Wavefronts
Yiin-Kuen Fuh, Hung-Shuo Hsu
J. Micro/Nanolith. MEMS MOEMS 10(4), 043004 (1 October 2011) https://doi.org/10.1117/1.3644990
TOPICS: Nanofibers, Nanolithography, Near field, Polymers, Silicon, Fabrication, Atomic force microscopy, Plasma, Microfluidics, Liquids
J. Micro/Nanolith. MEMS MOEMS 10(4), 043005 (1 October 2011) https://doi.org/10.1117/1.3646523
TOPICS: Photomasks, Chromium, Lithography, Etching, Electron beam lithography, Semiconductors, Semiconducting wafers, Inspection, Optical alignment, Silica
J. Micro/Nanolith. MEMS MOEMS 10(4), 043006 (1 October 2011) https://doi.org/10.1117/1.3644984
TOPICS: Photomasks, Inspection, Defect detection, Extreme ultraviolet, Wafer inspection, Semiconducting wafers, Defect inspection, Extreme ultraviolet lithography, Printing, Multilayers
J. Micro/Nanolith. MEMS MOEMS 10(4), 043007 (1 October 2011) https://doi.org/10.1117/1.3644620
TOPICS: Image compression, Computer programming, Image processing, Binary data, Maskless lithography, Lithography, Metals, Electron beams, Direct write lithography, Photomasks
J. Micro/Nanolith. MEMS MOEMS 10(4), 043008 (1 October 2011) https://doi.org/10.1117/1.3658024
TOPICS: Nanoimprint lithography, Photomasks, Semiconductors, Lithography, Semiconducting wafers, Electron beam lithography, Optical lithography, Extreme ultraviolet lithography, Overlay metrology, Electron beams
Long-Fang Tsai, William Dahlquist, Seunghyun Kim, Gregory Nordin
J. Micro/Nanolith. MEMS MOEMS 10(4), 043009 (1 October 2011) https://doi.org/10.1117/1.3659139
TOPICS: Silicon, Microfluidics, Adhesives, Sensors, Ultraviolet radiation, Epoxies, Assembly equipment, Semiconducting wafers, Temperature metrology, Target detection
J. Micro/Nanolith. MEMS MOEMS 10(4), 043010 (1 October 2011) https://doi.org/10.1117/1.3659144
TOPICS: Wafer-level optics, Cameras, Modulation transfer functions, Channel projecting optics, Image sensors, Microlens array, Microlens, Semiconducting wafers, Image resolution, Prototyping
Jinseok Heo, Jeong-Ho Yeo, Young-Hee Kim
J. Micro/Nanolith. MEMS MOEMS 10(4), 043011 (1 October 2011) https://doi.org/10.1117/1.3658022
TOPICS: Scanners, Semiconducting wafers, Inspection, Calibration, Lithography, Image analysis, Spatial resolution, Scanning electron microscopy, Imaging systems, Overlay metrology
J. Micro/Nanolith. MEMS MOEMS 10(4), 043012 (1 October 2011) https://doi.org/10.1117/1.3659145
TOPICS: Cadmium, Semiconducting wafers, Computer simulations, Electron beams, Detection and tracking algorithms, Electron beam lithography, Point spread functions, Model-based design, Modulation, Nanoelectronics
Silvino Altuna, Adrian Fernandez, Miguel Garcia, Maria Rodriguez, Jose Rodriguez
J. Micro/Nanolith. MEMS MOEMS 10(4), 043013 (1 October 2011) https://doi.org/10.1117/1.3661993
TOPICS: Carbon, Photoresist materials, Manufacturing, Photomasks, Lithography, Electrodes, Glasses, Capillaries, Aluminum, Resistance
Jue-Chin Yu, Peichen Yu, Hsueh-Yung Chao
J. Micro/Nanolith. MEMS MOEMS 10(4), 043014 (1 October 2011) https://doi.org/10.1117/1.3663249
TOPICS: Photomasks, SRAF, Optical proximity correction, Wavefronts, Nanoimprint lithography, Lithography, Chaos, Image segmentation, Diffraction, Resolution enhancement technologies
Arun John Kadaksham, Thomas Laursen, Timothy Owen, Jon Underwood, Abbas Rastegar
J. Micro/Nanolith. MEMS MOEMS 10(4), 043015 (1 October 2011) https://doi.org/10.1117/1.3655725
TOPICS: Photomasks, Quartz, Monte Carlo methods, Extreme ultraviolet lithography, Scanning electron microscopy, Extreme ultraviolet, Multilayers, Electron beam lithography, Lithography, Inspection
J. Micro/Nanolith. MEMS MOEMS 10(4), 043016 (1 October 2011) https://doi.org/10.1117/1.3655726
TOPICS: Metrology, Scatterometry, Critical dimension metrology, Semiconducting wafers, Data modeling, Atomic force microscopy, Fin field effect transitor, Transmission electron microscopy, Inspection, 3D metrology
J. Micro/Nanolith. MEMS MOEMS 10(4), 043017 (1 October 2011) https://doi.org/10.1117/1.3664410
TOPICS: Scanning electron microscopy, Model-based design, Monte Carlo methods, Calibration, Cadmium, Mathematical modeling, 3D metrology, Scatterometry, Semiconducting wafers, Metrology
COMMUNICATIONS
Yunqiao Wu, Jun Zhou, Edwin Pun
J. Micro/Nanolith. MEMS MOEMS 10(4), 049701 (1 October 2011) https://doi.org/10.1117/1.3665215
TOPICS: Liquids, Bioalcohols, Polymethylmethacrylate, Nanolithography, Capillaries, Silica, Fabrication, Scanning electron microscopy, Silicon, Image processing
Errata
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