Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 10 · NO. 1 | January 2011
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 10(1), 010101 (1 January 2011) https://doi.org/10.1117/1.3574901
TOPICS: Earthquakes, Safety
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 10(1), 010501 (1 January 2011) https://doi.org/10.1117/1.3563601
TOPICS: Silicon, Polymethylmethacrylate, Lithography, Nanolithography, Reactive ion etching, Etching, Electron beam lithography, Atomic force microscopy, Nanostructures, Scattering
Special Section on Theory and Practice of MEMS, NEMS, and MOEMS
J. Micro/Nanolith. MEMS MOEMS 10(1), 011501 (1 January 2011) https://doi.org/10.1117/1.3567190
TOPICS: Microelectromechanical systems, Microopto electromechanical systems, Nanoelectromechanical systems, Transducers, Nanotechnology, Materials science, Sensors, Actuators, Packaging, Nanolithography
J. Micro/Nanolith. MEMS MOEMS 10(1), 011502 (1 January 2011) https://doi.org/10.1117/1.3533325
TOPICS: Actuators, Seaborgium, Transistors, Sensors, Microfabrication, Sensing systems, Optical sensing, Numerical simulations, Mechanical engineering, Resolution enhancement technologies
J. Micro/Nanolith. MEMS MOEMS 10(1), 011503 (1 January 2011) https://doi.org/10.1117/1.3553393
TOPICS: Polymers, Photoresist materials, Manufacturing, Skin, Lithography, Electrodes, Photomasks, Near field diffraction, Ultraviolet radiation, Photoresist developing
J. Micro/Nanolith. MEMS MOEMS 10(1), 011504 (1 January 2011) https://doi.org/10.1117/1.3564031
TOPICS: Mirrors, Deformable mirrors, Electrodes, Electromechanical design, Photoresist materials, Aluminum, Annealing, Bulk micromachining, Reactive ion etching, Adaptive optics
J. Micro/Nanolith. MEMS MOEMS 10(1), 011505 (1 January 2011) https://doi.org/10.1117/1.3564864
TOPICS: Switches, Microelectromechanical systems, Gold, Copper, Nickel, Resistance, Platinum, Switching, Surface micromachining, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 10(1), 011506 (1 January 2011) https://doi.org/10.1117/1.3564881
TOPICS: Silicon, Nanoimprint lithography, Nanolithography, Electron beam lithography, Aluminum, Lithography, Etching, Semiconducting wafers, Photomasks, Dry etching
J. Micro/Nanolith. MEMS MOEMS 10(1), 011507 (1 January 2011) https://doi.org/10.1117/1.3565459
TOPICS: Gyroscopes, Packaging, Semiconducting wafers, Glasses, Microelectromechanical systems, Protactinium, Silicon, Wafer bonding, Titanium, Reliability
Articles
J. Micro/Nanolith. MEMS MOEMS 10(1), 013001 (1 January 2011) https://doi.org/10.1117/1.3532834
TOPICS: Resonators, Waveguides, Biosensing, Biosensors, Nanophotonics, Sensors, Silicon, Refractive index, Molecules, Microrings
J. Micro/Nanolith. MEMS MOEMS 10(1), 013002 (1 January 2011) https://doi.org/10.1117/1.3532835
TOPICS: Photomasks, Particles, Extreme ultraviolet lithography, Dielectrics, Electrodes, Quartz, Resistance, Dielectric polarization, Solids, Inspection
J. Micro/Nanolith. MEMS MOEMS 10(1), 013003 (1 January 2011) https://doi.org/10.1117/1.3553432
TOPICS: Electrodes, Sensors, Glucose, Platinum, Glasses, Silver, Temperature metrology, Scanning electron microscopy, Polymeric sensors, Polymers
J. Micro/Nanolith. MEMS MOEMS 10(1), 013004 (1 January 2011) https://doi.org/10.1117/1.3533222
TOPICS: Photomasks, Model-based design, 3D modeling, Extreme ultraviolet, Optical proximity correction, Process modeling, Computer simulations, Projection lithography, Scanners, Extreme ultraviolet lithography
J. Micro/Nanolith. MEMS MOEMS 10(1), 013005 (1 January 2011) https://doi.org/10.1117/1.3533231
TOPICS: Extreme ultraviolet lithography, Photomasks, Lithography, Extreme ultraviolet, Manufacturing, Semiconducting wafers, Diffraction, Critical dimension metrology, Optical lithography, Lithographic illumination
J. Micro/Nanolith. MEMS MOEMS 10(1), 013006 (1 January 2011) https://doi.org/10.1117/1.3549736
TOPICS: Metrology, Calibration, Environmental sensing, Quality measurement, Manufacturing, Control systems, Data processing, Standards development, Measurement devices, Error analysis
J. Micro/Nanolith. MEMS MOEMS 10(1), 013007 (1 January 2011) https://doi.org/10.1117/1.3533324
TOPICS: Calibration, Photomasks, Data modeling, Critical dimension metrology, Extreme ultraviolet lithography, Extreme ultraviolet, 3D modeling, Scanning electron microscopy, Semiconducting wafers, Metrology
J. Micro/Nanolith. MEMS MOEMS 10(1), 013008 (1 January 2011) https://doi.org/10.1117/1.3541778
TOPICS: Source mask optimization, Photomasks, Diffractive optical elements, Semiconducting wafers, Scanners, Manufacturing, Double patterning technology, Fiber optic illuminators, Optical lithography, Lithographic illumination
J. Micro/Nanolith. MEMS MOEMS 10(1), 013009 (1 January 2011) https://doi.org/10.1117/1.3541779
TOPICS: Pellicles, Semiconducting wafers, Critical dimension metrology, Reticles, Apodization, Lithography, Photomasks, Transmittance, Optical proximity correction, Phase shifts
J. Micro/Nanolith. MEMS MOEMS 10(1), 013010 (1 January 2011) https://doi.org/10.1117/1.3541780
TOPICS: Critical dimension metrology, Atomic force microscopy, Scanning electron microscopy, Critical dimension scanning electron microscopy, Monte Carlo methods, Model-based design, Silicon, Statistical analysis, Cadmium, Image processing
J. Micro/Nanolith. MEMS MOEMS 10(1), 013011 (1 January 2011) https://doi.org/10.1117/1.3541794
TOPICS: Photoresist materials, Holography, Copper, Metals, Polymers, Electrodes, Diffraction, Nanostructures, Nanolithography, Photomasks
J. Micro/Nanolith. MEMS MOEMS 10(1), 013012 (1 January 2011) https://doi.org/10.1117/1.3530082
TOPICS: Scanning electron microscopy, Optical proximity correction, Calibration, Image quality, Electron microscopes, Lithography, Semiconducting wafers, Critical dimension metrology, Optical alignment, Visualization
J. Micro/Nanolith. MEMS MOEMS 10(1), 013013 (1 January 2011) https://doi.org/10.1117/1.3532076
TOPICS: Overlay metrology, Semiconducting wafers, Metrology, Scanners, Critical dimension metrology, Birefringence, Distance measurement, Process control, Lithography, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 10(1), 013014 (1 January 2011) https://doi.org/10.1117/1.3545822
TOPICS: Transistors, Tolerancing, Lithography, Optical proximity correction, Critical dimension metrology, Device simulation, Logic, Error analysis, Digital electronics, Computer simulations
J. Micro/Nanolith. MEMS MOEMS 10(1), 013015 (1 January 2011) https://doi.org/10.1117/1.3549914
TOPICS: Calibration, Metrology, Atomic force microscope, Atomic force microscopy, Standards development, Error analysis, Interferometry, Scanners, Interferometers, Helium neon lasers
J. Micro/Nanolith. MEMS MOEMS 10(1), 013016 (1 January 2011) https://doi.org/10.1117/1.3549920
TOPICS: Actuators, Nickel, Dielectrics, Distance measurement, Data modeling, Motion models, Electrodes, Optical lithography, Electroplating, Image processing
J. Micro/Nanolith. MEMS MOEMS 10(1), 013017 (1 January 2011) https://doi.org/10.1117/1.3555090
TOPICS: Extreme ultraviolet, Diffusion, Polymers, Data modeling, Line width roughness, Extreme ultraviolet lithography, Quantum efficiency, Absorbance, Silicon, Contamination
J. Micro/Nanolith. MEMS MOEMS 10(1), 013018 (1 January 2011) https://doi.org/10.1117/1.3555125
TOPICS: Sensors, Electrodes, Capacitors, Semiconductors, Capacitance, CMOS sensors, Etching, Metals, Silicon, Finite element methods
J. Micro/Nanolith. MEMS MOEMS 10(1), 013019 (1 January 2011) https://doi.org/10.1117/1.3563599
TOPICS: Polishing, Surface finishing, Surface roughness, Micromachining, Photoresist developing, Scanning probe microscopy, Microelectromechanical systems, Multilayers, Particles, Photoresist materials
J. Micro/Nanolith. MEMS MOEMS 10(1), 013020 (1 January 2011) https://doi.org/10.1117/1.3565449
TOPICS: Manufacturing, Tolerancing, Optical proximity correction, Design for manufacturability, Failure analysis, Optics manufacturing, Capacitance, Optical calibration, Clocks, Lithography
J. Micro/Nanolith. MEMS MOEMS 10(1), 013021 (1 January 2011) https://doi.org/10.1117/1.3565466
TOPICS: Calibration, Silicon, Multilayers, Scanning electron microscopy, Diffraction gratings, Electron microscopes, Wet etching, Polishing, Surface finishing, Thin films
Errata
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