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1 October 2011 Errata: Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects
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This PDF file contains the errata for “JM3 Vol. 10 Issue 04 Paper 3647513” for JM3 Vol. 10 Issue 04
Philip C. W. Ng, Kuen-Yu Tsai, and Lawrence S. Melvin III "Errata: Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects," Journal of Micro/Nanolithography, MEMS, and MOEMS 10(4), 049801 (1 October 2011). https://doi.org/10.1117/1.3647513
Published: 1 October 2011
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