journal of micro nanolithography mems and moems
VOL. 11 · NO. 2 | April 2012
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 11(2), 020101 (15 June 2012) https://doi.org/10.1117/1.JMM.11.2.020101
TOPICS: Stochastic processes, Monte Carlo methods, Aluminum, Photoresist developing, Calibration, Lithography, Spectroscopy, Lead, Physical sciences, Photoresist materials
Special Section on EUV Sources for Lithography
J. Micro/Nanolith. MEMS MOEMS 11(2), 021101 (13 June 2012) https://doi.org/10.1117/1.JMM.11.2.021101
TOPICS: Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Metrology, Optical lithography, Semiconductor manufacturing, Laser applications, Laser metrology, High volume manufacturing, Integrated circuits
Roel Moors, Vadim Banine, Geert Swinkels, Frans Wortel
J. Micro/Nanolith. MEMS MOEMS 11(2), 021102 (21 May 2012) https://doi.org/10.1117/1.JMM.11.2.021102
TOPICS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Plasma, EUV optics, Deep ultraviolet, Semiconducting wafers, Imaging systems, Lithography, Mirrors
Konstantin Koshelev, Vladimir Krivtsun, Vladimir Ivanov, Oleg Yakushev, Alexey Chekmarev, Vsevolod Koloshnikov, Evegenii Snegirev, Viacheslav Medvedev
J. Micro/Nanolith. MEMS MOEMS 11(2), 021103 (16 May 2012) https://doi.org/10.1117/1.JMM.11.2.021103
TOPICS: Tin, Extreme ultraviolet, Electrodes, Plasma, Liquids, Ions, Gallium, Metals, Capacitors, Solids
J. Micro/Nanolith. MEMS MOEMS 11(2), 021104 (29 May 2012) https://doi.org/10.1117/1.JMM.11.2.021104
TOPICS: Tin, Plasma, Extreme ultraviolet, Gas lasers, Extreme ultraviolet lithography, Photons, Mirrors, Light sources, Pulsed laser operation, Carbon monoxide
J. Micro/Nanolith. MEMS MOEMS 11(2), 021105 (21 May 2012) https://doi.org/10.1117/1.JMM.11.2.021105
TOPICS: Extreme ultraviolet, Plasma, Light sources, Photomasks, Metrology, Inspection, Modulators, Xenon, Extreme ultraviolet lithography, Magnetism
Markus Benk, Klaus Bergmann
J. Micro/Nanolith. MEMS MOEMS 11(2), 021106 (15 June 2012) https://doi.org/10.1117/1.JMM.11.2.021106
TOPICS: Extreme ultraviolet, Plasma, Electrodes, Extreme ultraviolet lithography, Xenon, X-rays, Metrology, Microscopy, Nitrogen, Coded apertures
Peter Choi, Sergey Zakharov, Raul Aliaga-Rossel, Aldrice Bakouboula, Otman Benali, Philippe Bove, Michèle Cau, Grainne Duffy, Osamu Iwase, Keith Powell, Blair Lebert, Ouassima Sarroukh, Clement Zaepffel, Vasily Zakharov
J. Micro/Nanolith. MEMS MOEMS 11(2), 021107 (7 June 2012) https://doi.org/10.1117/1.JMM.11.2.021107
TOPICS: Extreme ultraviolet, Plasma, Inspection, Metrology, Xenon, Multiplexing, Light sources, Ions, Tin, Capillaries
Gerard O'Sullivan, Bowen Li
J. Micro/Nanolith. MEMS MOEMS 11(2), 021108 (29 May 2012) https://doi.org/10.1117/1.JMM.11.2.021108
TOPICS: Plasma, Laser development, Gadolinium, Tin, Ions, Extreme ultraviolet lithography, Gas lasers, Nd:YAG lasers, Extreme ultraviolet, Cerium
J. Micro/Nanolith. MEMS MOEMS 11(2), 021109 (21 May 2012) https://doi.org/10.1117/1.JMM.11.2.021109
TOPICS: Plasma, Extreme ultraviolet, Tin, Extreme ultraviolet lithography, Xenon, Magnetism, Opacity, Pulsed laser operation, Gas lasers, Ions
J. Micro/Nanolith. MEMS MOEMS 11(2), 021110 (29 June 2012) https://doi.org/10.1117/1.JMM.11.2.021110
TOPICS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers
J. Micro/Nanolith. MEMS MOEMS 11(2), 021111 (29 May 2012) https://doi.org/10.1117/1.JMM.11.2.021111
TOPICS: Gas lasers, Extreme ultraviolet, Tin, Carbon monoxide, Light sources, Pulsed laser operation, Extreme ultraviolet lithography, Magnetism, Ions, Laser applications
Konstantin Koshelev, Vladimir Ivanov, Viacheslav Medvedev, Vladimir Krivtsun, Vladimir Novikov, Alexander Grushin
J. Micro/Nanolith. MEMS MOEMS 11(2), 021112 (21 May 2012) https://doi.org/10.1117/1.JMM.11.2.021112
TOPICS: Plasma, Extreme ultraviolet, Tin, Absorption, Ions, Pulsed laser operation, Gas lasers, Ultraviolet radiation, Liquids, 3D modeling
J. Micro/Nanolith. MEMS MOEMS 11(2), 021113 (20 June 2012) https://doi.org/10.1117/1.JMM.11.2.021113
TOPICS: Gas lasers, Carbon monoxide, Optical amplifiers, Pulsed laser operation, Extreme ultraviolet, Laser applications, Oscillators, Thermal effects, Quantum cascade lasers, Solid state lasers
J. Micro/Nanolith. MEMS MOEMS 11(2), 021114 (11 June 2012) https://doi.org/10.1117/1.JMM.11.2.021114
TOPICS: Extreme ultraviolet, Plasma, Tin, Extreme ultraviolet lithography, Ions, Light sources, Mirrors, Lithography, Inspection, Laser applications
Nikolay Chkhalo, Mikhail Drozdov, Evgeniy Kluenkov, Alexsei Lopatin, Valerii Luchin, Nikolay Salashchenko, Nikolay Tsybin, Leonid Sjmaenok, Vadim Banine, Andrei Yakunin
J. Micro/Nanolith. MEMS MOEMS 11(2), 021115 (31 May 2012) https://doi.org/10.1117/1.JMM.11.2.021115
TOPICS: Multilayers, Transparency, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Optical filters, Zirconium, Silicon, Gas lasers, Oxidation
J. Micro/Nanolith. MEMS MOEMS 11(2), 021116 (10 May 2012) https://doi.org/10.1117/1.JMM.11.2.021116
TOPICS: Absorption, Gas lasers, Molecules, Infrared radiation, Extreme ultraviolet, Carbon monoxide, Photons, Optical filters, Plasma, Molecular lasers
J. Micro/Nanolith. MEMS MOEMS 11(2), 021117 (31 May 2012) https://doi.org/10.1117/1.JMM.11.2.021117
TOPICS: Plasma, Extreme ultraviolet, Ions, Tin, Light sources, Charged particle optics, Argon, Crystals, Carbon, Silicon
Wouter Soer, Maarten van Herpen, Martin Jak, Peter Gawlitza, Stefan Braun, Nikolay Salashchenko, Vadim Banine
J. Micro/Nanolith. MEMS MOEMS 11(2), 021118 (3 May 2012) https://doi.org/10.1117/1.JMM.11.2.021118
TOPICS: Tin, Mirrors, Extreme ultraviolet, Silicon, Reflectivity, Multilayers, Molybdenum, Hydrogen, Infrared radiation, Contamination
J. Micro/Nanolith. MEMS MOEMS 11(2), 021119 (10 May 2012) https://doi.org/10.1117/1.JMM.11.2.021119
TOPICS: Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Lithography, Laser applications, Plasma, Inspection, Photomasks, X-ray lasers, Picosecond phenomena
John Madey, Luis Elias, Eric Szarmes
J. Micro/Nanolith. MEMS MOEMS 11(2), 021120 (28 June 2012) https://doi.org/10.1117/1.JMM.11.2.021120
TOPICS: Extreme ultraviolet, Light sources, Mirrors, Electron beams, Laser scattering, Picosecond phenomena, Pulsed laser operation, Transmission electron microscopy, Optical storage, Scattering
Hironari Yamada, Dorian Minkov, Taichi Hayashi, Daisuke Hasegawa
J. Micro/Nanolith. MEMS MOEMS 11(2), 021121 (29 May 2012) https://doi.org/10.1117/1.JMM.11.2.021121
TOPICS: Extreme ultraviolet lithography, Extreme ultraviolet, Aluminum, Synchrotrons, Electron beams, X-rays, Magnetism, Chromium, Optical filters, Tin
Evgeny Schneidmiller, Vladimir Vogel, Hans Weise, Mikhail Yurkov
J. Micro/Nanolith. MEMS MOEMS 11(2), 021122 (29 May 2012) https://doi.org/10.1117/1.JMM.11.2.021122
TOPICS: Free electron lasers, Electron beams, Superconductors, Light sources, Laser applications, Lithography, Magnetism, X-rays, Plasma, Extreme ultraviolet
Nikolay Chkhalo, Nikolay Salashchenko, Sergei Golubev, Dmitry Mansfeld, Alexander Vodopyanov, Leonid Sjmaenok
J. Micro/Nanolith. MEMS MOEMS 11(2), 021123 (21 May 2012) https://doi.org/10.1117/1.JMM.11.2.021123
TOPICS: Plasma, Extreme ultraviolet, Ions, Magnetism, Microwave radiation, Ionization, Mirrors, Sensors, Extreme ultraviolet lithography, Plasma generation
Kazuyuki Sakaue, Akira Endo, Masakazu Washio
J. Micro/Nanolith. MEMS MOEMS 11(2), 021124 (3 May 2012) https://doi.org/10.1117/1.JMM.11.2.021124
TOPICS: Gas lasers, Carbon monoxide, Electron beams, Pulsed laser operation, Mirrors, Picosecond phenomena, Extreme ultraviolet, Laser scattering, Laser applications, X-rays
Special Section on Reliability, Packaging, Testing, and Characterization of MEMS and MOEMS III
J. Micro/Nanolith. MEMS MOEMS 11(2), 021201 (29 June 2012) https://doi.org/10.1117/1.JMM.11.2.021201
TOPICS: Reliability, Packaging, Microopto electromechanical systems, Microelectromechanical systems, Nanostructures, Nanofabrication
J. Micro/Nanolith. MEMS MOEMS 11(2), 021202 (7 May 2012) https://doi.org/10.1117/1.JMM.11.2.021202
TOPICS: Silver, Sensors, Microelectromechanical systems, Microopto electromechanical systems, Packaging, Wheatstone bridges, Light emitting diodes, Optoelectronic devices, Silicon, Indium gallium nitride
Rajesh Burra, Jyothi Vankara, D. V. Rama Kota Reddy
J. Micro/Nanolith. MEMS MOEMS 11(2), 021203 (10 May 2012) https://doi.org/10.1117/1.JMM.11.2.021203
TOPICS: Resonators, Finite element methods, Sensors, Biosensors, Crystals, Microelectromechanical systems, Systems modeling, Differential equations, Modal analysis, Molecular interactions
Sandeep Sangameswaran, Jeroen De Coster, Guido Groeseneken, Ingrid De Wolf
J. Micro/Nanolith. MEMS MOEMS 11(2), 021204 (14 May 2012) https://doi.org/10.1117/1.JMM.11.2.021204
TOPICS: Microelectromechanical systems, Switches, Electrical breakdown, Actuators, Reliability, Dielectrics, Electrodes, Micromirrors, Laser Doppler velocimetry, Microopto electromechanical systems
Yasser Sabry, Mostafa Medhat, Bassam Saadany, Diaa Khalil, Tarik Bourouina
J. Micro/Nanolith. MEMS MOEMS 11(2), 021205 (7 May 2012) https://doi.org/10.1117/1.JMM.11.2.021205
TOPICS: Capacitance, Microelectromechanical systems, Actuators, Resonators, Inductance, Silicon, Resistance, Aluminum, MATLAB, Optimization (mathematics)
Jeng-Nan Hung, Hong Hocheng
J. Micro/Nanolith. MEMS MOEMS 11(2), 021206 (11 May 2012) https://doi.org/10.1117/1.JMM.11.2.021206
TOPICS: Actuators, Silicon, Microelectromechanical systems, Etching, Oxides, Reliability, Testing and analysis, Mechanical engineering, Thin films, Silicon films
Pejman Monajemi
J. Micro/Nanolith. MEMS MOEMS 11(2), 021207 (10 May 2012) https://doi.org/10.1117/1.JMM.11.2.021207
TOPICS: Microelectromechanical systems, Polymers, Electrodes, Silicon, Capacitors, Capacitance, Gold, Oxides, Actuators, Dielectrics
Regular Articles
Shinya Yoshida, Masayoshi Esashi, Tatsuya Kobayashi, Masafumi Kumano
J. Micro/Nanolith. MEMS MOEMS 11(2), 023001 (14 May 2012) https://doi.org/10.1117/1.JMM.11.2.023001
TOPICS: Lithography, Coating, Deep ultraviolet, Polymers, Chemical vapor deposition, Silicon, Optical lithography, Polymer thin films, Atomic force microscopy, Microelectromechanical systems
Jinyang Liang, Michael Becker, Rudolph Kohn, Daniel Heinzen
J. Micro/Nanolith. MEMS MOEMS 11(2), 023002 (21 May 2012) https://doi.org/10.1117/1.JMM.11.2.023002
TOPICS: Digital micromirror devices, Beam shaping, Chemical species, Cameras, Light sources, Diffraction, Micromirrors, Linear filtering, Imaging systems, Calibration
Anna Rissanen, Altti Akujärvi, Jarkko Antila, Martti Blomberg, Heikki Saari
J. Micro/Nanolith. MEMS MOEMS 11(2), 023003 (25 May 2012) https://doi.org/10.1117/1.JMM.11.2.023003
TOPICS: Microopto electromechanical systems, Spectrometers, Mirrors, Atomic layer deposition, Fabry–Perot interferometry, Aluminum, Electrodes, Visible radiation, Semiconducting wafers, Optical filters
Hoonchul Ryoo, Dong Won Kang, Jae Hahn, Yo-Tak Song
J. Micro/Nanolith. MEMS MOEMS 11(2), 023004 (1 June 2012) https://doi.org/10.1117/1.JMM.11.2.023004
TOPICS: Photoresist materials, Maskless lithography, Digital micromirror devices, Laser sources, Optical simulations, Optical lithography, Digital imaging, Lithography, Computer aided design, Photomasks
Craig McGray, Ndubuisi Orji, Ronald Dixson, Michael Cresswell, Richard Allen, Jon Geist, Richard Kasica
J. Micro/Nanolith. MEMS MOEMS 11(2), 023005 (29 May 2012) https://doi.org/10.1117/1.JMM.11.2.023005
TOPICS: Etching, Crystals, Nanostructures, Photomasks, Silicon, Nanolithography, Lithography, Optical alignment, Atomic force microscopy, Semiconducting wafers
Jinkui Chu, Jiali Gao, Le Guan, Guoqing Zhang, Ze Liu
J. Micro/Nanolith. MEMS MOEMS 11(2), 023006 (1 June 2012) https://doi.org/10.1117/1.JMM.11.2.023006
TOPICS: Thin films, Photoresist materials, Microelectromechanical systems, Numerical simulations, Testing and analysis, Semiconducting wafers, Photomicroscopy, Ultraviolet radiation, Polymers, Finite element methods
J. Micro/Nanolith. MEMS MOEMS 11(2), 023007 (5 June 2012) https://doi.org/10.1117/1.JMM.11.2.023007
TOPICS: Photoresist materials, Metrology, Critical dimension metrology, Time metrology, Semiconducting wafers, Scanning electron microscopy, Lithography, Etching, Diffractive optical elements, Optical proximity correction
Miyako Matsui, Tasuku Yano, Takayuki Odaka, Hiroshi Nagaishi, Koichi Sakurai
J. Micro/Nanolith. MEMS MOEMS 11(2), 023008 (7 June 2012) https://doi.org/10.1117/1.JMM.11.2.023008
TOPICS: Resistance, Semiconducting wafers, Scanning electron microscopy, Calibration, Inspection, Manufacturing, Device simulation, Electron microscopes, Silicon, Defect detection
J. Micro/Nanolith. MEMS MOEMS 11(2), 023009 (7 June 2012) https://doi.org/10.1117/1.JMM.11.2.023009
TOPICS: Lithography, Principal component analysis, Sensors, Monochromatic aberrations, Wavefront aberrations, Image sensors, Semiconducting wafers, Image processing, Photomasks, Process modeling
Joung-Man Park, Dong-Jun Kwon, Zuo-Jia Wang, Ga-Young Gu, Lawrence DeVries
J. Micro/Nanolith. MEMS MOEMS 11(2), 023010 (7 June 2012) https://doi.org/10.1117/1.JMM.11.2.023010
TOPICS: Nanoparticles, Resistance, Positron emission tomography, Indium, Tin, Oxides, Temperature metrology, Carbon nanotubes, Electrodes, Transmittance
Gerd Brandstetter, Sanjay Govindjee
J. Micro/Nanolith. MEMS MOEMS 11(2), 023011 (13 June 2012) https://doi.org/10.1117/1.JMM.11.2.023011
TOPICS: Particles, Photomasks, Reticles, Extreme ultraviolet lithography, Particle contamination, Spherical lenses, Data modeling, Finite element methods, Tolerancing, Dielectrics
J. Micro/Nanolith. MEMS MOEMS 11(2), 023012 (20 June 2012) https://doi.org/10.1117/1.JMM.11.2.023012
TOPICS: Actuators, Deep reactive ion etching, Etching, Microelectromechanical systems, Oxides, Silicon, Scanning electron microscopy, Gold, Sputter deposition, Atomic force microscopy
Alex Janzen, Sommayyeh Poshtiban, Amit Singh, Stephane Evoy
J. Micro/Nanolith. MEMS MOEMS 11(2), 023013 (20 June 2012) https://doi.org/10.1117/1.JMM.11.2.023013
TOPICS: Resonators, Nanoimprint lithography, Nanolithography, Finite element methods, Biosensing, Biological research, Etching, Chemical elements, Electron beam lithography, Polymethylmethacrylate
J. Micro/Nanolith. MEMS MOEMS 11(2), 023014 (20 June 2012) https://doi.org/10.1117/1.JMM.11.2.023014
TOPICS: Microlens array, Microlens, Glasses, Laser ablation, Laser applications, Soda-lime glass, Polymers, Confocal microscopy, Aluminum, Infrared lasers
Errata
J. Micro/Nanolith. MEMS MOEMS 11(2), 029801 (29 June 2012) https://doi.org/10.1117/1.JMM.11.2.029801
TOPICS: Stochastic processes, Systems modeling, Lithography, 3D modeling, Diffusion, Point spread functions, Roads, Convolution
Konstantin Koshelev, Vladimir Ivanov, Viacheslav Medvedev, Vladimir Krivtsun, Vladimir Novikov, Alexander Grushin
J. Micro/Nanolith. MEMS MOEMS 11(2), 029802 (26 June 2012) https://doi.org/10.1117/1.JMM.11.2.029802
TOPICS: Tin, Plasma, Extreme ultraviolet, Ultraviolet radiation, Spectroscopy, Applied mathematics, Mathematical modeling
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