Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 11 · NO. 2 | April 2012
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 11(2), 020101 (15 June 2012) https://doi.org/10.1117/1.JMM.11.2.020101
TOPICS: Stochastic processes, Monte Carlo methods, Aluminum, Photoresist developing, Calibration, Lithography, Spectroscopy, Lead, Physical sciences, Photoresist materials
Special Section on EUV Sources for Lithography
J. Micro/Nanolith. MEMS MOEMS 11(2), 021101 (13 June 2012) https://doi.org/10.1117/1.JMM.11.2.021101
TOPICS: Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Metrology, Optical lithography, Semiconductor manufacturing, Laser applications, Laser metrology, High volume manufacturing, Integrated circuits
J. Micro/Nanolith. MEMS MOEMS 11(2), 021102 (21 May 2012) https://doi.org/10.1117/1.JMM.11.2.021102
TOPICS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Plasma, EUV optics, Deep ultraviolet, Semiconducting wafers, Imaging systems, Lithography, Mirrors
J. Micro/Nanolith. MEMS MOEMS 11(2), 021103 (16 May 2012) https://doi.org/10.1117/1.JMM.11.2.021103
TOPICS: Tin, Extreme ultraviolet, Electrodes, Plasma, Liquids, Ions, Gallium, Metals, Capacitors, Solids
J. Micro/Nanolith. MEMS MOEMS 11(2), 021104 (29 May 2012) https://doi.org/10.1117/1.JMM.11.2.021104
TOPICS: Tin, Plasma, Extreme ultraviolet, Gas lasers, Extreme ultraviolet lithography, Photons, Mirrors, Light sources, Pulsed laser operation, Carbon monoxide
J. Micro/Nanolith. MEMS MOEMS 11(2), 021105 (21 May 2012) https://doi.org/10.1117/1.JMM.11.2.021105
TOPICS: Extreme ultraviolet, Plasma, Light sources, Photomasks, Metrology, Inspection, Modulators, Xenon, Extreme ultraviolet lithography, Magnetism
J. Micro/Nanolith. MEMS MOEMS 11(2), 021106 (15 June 2012) https://doi.org/10.1117/1.JMM.11.2.021106
TOPICS: Extreme ultraviolet, Plasma, Electrodes, Extreme ultraviolet lithography, Xenon, X-rays, Metrology, Microscopy, Nitrogen, Coded apertures
J. Micro/Nanolith. MEMS MOEMS 11(2), 021107 (7 June 2012) https://doi.org/10.1117/1.JMM.11.2.021107
TOPICS: Extreme ultraviolet, Plasma, Inspection, Metrology, Xenon, Multiplexing, Light sources, Ions, Tin, Capillaries
J. Micro/Nanolith. MEMS MOEMS 11(2), 021108 (29 May 2012) https://doi.org/10.1117/1.JMM.11.2.021108
TOPICS: Plasma, Laser development, Gadolinium, Tin, Ions, Extreme ultraviolet lithography, Gas lasers, Nd:YAG lasers, Extreme ultraviolet, Cerium
J. Micro/Nanolith. MEMS MOEMS 11(2), 021109 (21 May 2012) https://doi.org/10.1117/1.JMM.11.2.021109
TOPICS: Plasma, Extreme ultraviolet, Tin, Extreme ultraviolet lithography, Xenon, Magnetism, Opacity, Pulsed laser operation, Gas lasers, Ions
J. Micro/Nanolith. MEMS MOEMS 11(2), 021110 (29 June 2012) https://doi.org/10.1117/1.JMM.11.2.021110
TOPICS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers
J. Micro/Nanolith. MEMS MOEMS 11(2), 021111 (29 May 2012) https://doi.org/10.1117/1.JMM.11.2.021111
TOPICS: Gas lasers, Extreme ultraviolet, Tin, Carbon monoxide, Light sources, Pulsed laser operation, Extreme ultraviolet lithography, Magnetism, Ions, Laser applications
J. Micro/Nanolith. MEMS MOEMS 11(2), 021112 (21 May 2012) https://doi.org/10.1117/1.JMM.11.2.021112
TOPICS: Plasma, Extreme ultraviolet, Tin, Absorption, Ions, Pulsed laser operation, Gas lasers, Ultraviolet radiation, Liquids, 3D modeling
J. Micro/Nanolith. MEMS MOEMS 11(2), 021113 (20 June 2012) https://doi.org/10.1117/1.JMM.11.2.021113
TOPICS: Gas lasers, Carbon monoxide, Optical amplifiers, Pulsed laser operation, Extreme ultraviolet, Laser applications, Oscillators, Thermal effects, Quantum cascade lasers, Solid state lasers
J. Micro/Nanolith. MEMS MOEMS 11(2), 021114 (11 June 2012) https://doi.org/10.1117/1.JMM.11.2.021114
TOPICS: Extreme ultraviolet, Plasma, Tin, Extreme ultraviolet lithography, Ions, Light sources, Mirrors, Lithography, Inspection, Laser applications
J. Micro/Nanolith. MEMS MOEMS 11(2), 021115 (31 May 2012) https://doi.org/10.1117/1.JMM.11.2.021115
TOPICS: Multilayers, Transparency, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Optical filters, Zirconium, Silicon, Gas lasers, Oxidation
J. Micro/Nanolith. MEMS MOEMS 11(2), 021116 (10 May 2012) https://doi.org/10.1117/1.JMM.11.2.021116
TOPICS: Absorption, Gas lasers, Molecules, Infrared radiation, Extreme ultraviolet, Carbon monoxide, Photons, Optical filters, Plasma, Molecular lasers
J. Micro/Nanolith. MEMS MOEMS 11(2), 021117 (31 May 2012) https://doi.org/10.1117/1.JMM.11.2.021117
TOPICS: Plasma, Extreme ultraviolet, Ions, Tin, Light sources, Charged particle optics, Argon, Crystals, Carbon, Silicon
J. Micro/Nanolith. MEMS MOEMS 11(2), 021118 (3 May 2012) https://doi.org/10.1117/1.JMM.11.2.021118
TOPICS: Tin, Mirrors, Extreme ultraviolet, Silicon, Reflectivity, Multilayers, Molybdenum, Hydrogen, Infrared radiation, Contamination
J. Micro/Nanolith. MEMS MOEMS 11(2), 021119 (10 May 2012) https://doi.org/10.1117/1.JMM.11.2.021119
TOPICS: Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Lithography, Laser applications, Plasma, Inspection, Photomasks, X-ray lasers, Picosecond phenomena
J. Micro/Nanolith. MEMS MOEMS 11(2), 021120 (28 June 2012) https://doi.org/10.1117/1.JMM.11.2.021120
TOPICS: Extreme ultraviolet, Light sources, Mirrors, Electron beams, Laser scattering, Picosecond phenomena, Pulsed laser operation, Transmission electron microscopy, Optical storage, Scattering
J. Micro/Nanolith. MEMS MOEMS 11(2), 021121 (29 May 2012) https://doi.org/10.1117/1.JMM.11.2.021121
TOPICS: Extreme ultraviolet lithography, Extreme ultraviolet, Aluminum, Synchrotrons, Electron beams, X-rays, Magnetism, Chromium, Optical filters, Tin
J. Micro/Nanolith. MEMS MOEMS 11(2), 021122 (29 May 2012) https://doi.org/10.1117/1.JMM.11.2.021122
TOPICS: Free electron lasers, Electron beams, Superconductors, Light sources, Laser applications, Lithography, Magnetism, X-rays, Plasma, Extreme ultraviolet
J. Micro/Nanolith. MEMS MOEMS 11(2), 021123 (21 May 2012) https://doi.org/10.1117/1.JMM.11.2.021123
TOPICS: Plasma, Extreme ultraviolet, Ions, Magnetism, Microwave radiation, Ionization, Mirrors, Sensors, Extreme ultraviolet lithography, Plasma generation
J. Micro/Nanolith. MEMS MOEMS 11(2), 021124 (3 May 2012) https://doi.org/10.1117/1.JMM.11.2.021124
TOPICS: Gas lasers, Carbon monoxide, Electron beams, Pulsed laser operation, Mirrors, Picosecond phenomena, Extreme ultraviolet, Laser scattering, Laser applications, X-rays
Special Section on Reliability, Packaging, Testing, and Characterization of MEMS and MOEMS III
J. Micro/Nanolith. MEMS MOEMS 11(2), 021201 (29 June 2012) https://doi.org/10.1117/1.JMM.11.2.021201
TOPICS: Reliability, Packaging, Microopto electromechanical systems, Microelectromechanical systems, Nanostructures, Nanofabrication
J. Micro/Nanolith. MEMS MOEMS 11(2), 021202 (7 May 2012) https://doi.org/10.1117/1.JMM.11.2.021202
TOPICS: Silver, Sensors, Microelectromechanical systems, Microopto electromechanical systems, Packaging, Wheatstone bridges, Light emitting diodes, Optoelectronic devices, Silicon, Indium gallium nitride
J. Micro/Nanolith. MEMS MOEMS 11(2), 021203 (10 May 2012) https://doi.org/10.1117/1.JMM.11.2.021203
TOPICS: Resonators, Finite element methods, Sensors, Biosensors, Crystals, Microelectromechanical systems, Systems modeling, Differential equations, Modal analysis, Molecular interactions
J. Micro/Nanolith. MEMS MOEMS 11(2), 021204 (14 May 2012) https://doi.org/10.1117/1.JMM.11.2.021204
TOPICS: Microelectromechanical systems, Switches, Electrical breakdown, Actuators, Reliability, Dielectrics, Electrodes, Micromirrors, Laser Doppler velocimetry, Microopto electromechanical systems
J. Micro/Nanolith. MEMS MOEMS 11(2), 021205 (7 May 2012) https://doi.org/10.1117/1.JMM.11.2.021205
TOPICS: Capacitance, Microelectromechanical systems, Actuators, Resonators, Inductance, Silicon, Resistance, Aluminum, MATLAB, Optimization (mathematics)
J. Micro/Nanolith. MEMS MOEMS 11(2), 021206 (11 May 2012) https://doi.org/10.1117/1.JMM.11.2.021206
TOPICS: Actuators, Silicon, Microelectromechanical systems, Etching, Oxides, Reliability, Testing and analysis, Mechanical engineering, Thin films, Silicon films
J. Micro/Nanolith. MEMS MOEMS 11(2), 021207 (10 May 2012) https://doi.org/10.1117/1.JMM.11.2.021207
TOPICS: Microelectromechanical systems, Polymers, Electrodes, Silicon, Capacitors, Capacitance, Gold, Oxides, Actuators, Dielectrics
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 11(2), 023001 (14 May 2012) https://doi.org/10.1117/1.JMM.11.2.023001
TOPICS: Lithography, Coating, Deep ultraviolet, Polymers, Chemical vapor deposition, Silicon, Optical lithography, Polymer thin films, Atomic force microscopy, Microelectromechanical systems
J. Micro/Nanolith. MEMS MOEMS 11(2), 023002 (21 May 2012) https://doi.org/10.1117/1.JMM.11.2.023002
TOPICS: Digital micromirror devices, Beam shaping, Chemical species, Cameras, Light sources, Diffraction, Micromirrors, Linear filtering, Imaging systems, Calibration
J. Micro/Nanolith. MEMS MOEMS 11(2), 023003 (25 May 2012) https://doi.org/10.1117/1.JMM.11.2.023003
TOPICS: Microopto electromechanical systems, Spectrometers, Mirrors, Atomic layer deposition, Fabry–Perot interferometry, Aluminum, Electrodes, Visible radiation, Semiconducting wafers, Optical filters
J. Micro/Nanolith. MEMS MOEMS 11(2), 023004 (1 June 2012) https://doi.org/10.1117/1.JMM.11.2.023004
TOPICS: Photoresist materials, Maskless lithography, Digital micromirror devices, Laser sources, Optical simulations, Optical lithography, Digital imaging, Lithography, Computer aided design, Photomasks
J. Micro/Nanolith. MEMS MOEMS 11(2), 023005 (29 May 2012) https://doi.org/10.1117/1.JMM.11.2.023005
TOPICS: Etching, Crystals, Nanostructures, Photomasks, Silicon, Nanolithography, Lithography, Optical alignment, Atomic force microscopy, Semiconducting wafers
J. Micro/Nanolith. MEMS MOEMS 11(2), 023006 (1 June 2012) https://doi.org/10.1117/1.JMM.11.2.023006
TOPICS: Thin films, Photoresist materials, Microelectromechanical systems, Numerical simulations, Testing and analysis, Semiconducting wafers, Photomicroscopy, Ultraviolet radiation, Polymers, Finite element methods
J. Micro/Nanolith. MEMS MOEMS 11(2), 023007 (5 June 2012) https://doi.org/10.1117/1.JMM.11.2.023007
TOPICS: Photoresist materials, Metrology, Critical dimension metrology, Time metrology, Semiconducting wafers, Scanning electron microscopy, Lithography, Etching, Diffractive optical elements, Optical proximity correction
J. Micro/Nanolith. MEMS MOEMS 11(2), 023008 (7 June 2012) https://doi.org/10.1117/1.JMM.11.2.023008
TOPICS: Resistance, Semiconducting wafers, Scanning electron microscopy, Calibration, Inspection, Manufacturing, Device simulation, Electron microscopes, Silicon, Defect detection
J. Micro/Nanolith. MEMS MOEMS 11(2), 023009 (7 June 2012) https://doi.org/10.1117/1.JMM.11.2.023009
TOPICS: Lithography, Principal component analysis, Sensors, Monochromatic aberrations, Wavefront aberrations, Image sensors, Semiconducting wafers, Image processing, Photomasks, Process modeling
J. Micro/Nanolith. MEMS MOEMS 11(2), 023010 (7 June 2012) https://doi.org/10.1117/1.JMM.11.2.023010
TOPICS: Nanoparticles, Resistance, Positron emission tomography, Indium, Tin, Oxides, Temperature metrology, Carbon nanotubes, Electrodes, Transmittance
J. Micro/Nanolith. MEMS MOEMS 11(2), 023011 (13 June 2012) https://doi.org/10.1117/1.JMM.11.2.023011
TOPICS: Particles, Photomasks, Reticles, Extreme ultraviolet lithography, Particle contamination, Spherical lenses, Data modeling, Finite element methods, Tolerancing, Dielectrics
J. Micro/Nanolith. MEMS MOEMS 11(2), 023012 (20 June 2012) https://doi.org/10.1117/1.JMM.11.2.023012
TOPICS: Actuators, Deep reactive ion etching, Etching, Microelectromechanical systems, Oxides, Silicon, Scanning electron microscopy, Gold, Sputter deposition, Atomic force microscopy
J. Micro/Nanolith. MEMS MOEMS 11(2), 023013 (20 June 2012) https://doi.org/10.1117/1.JMM.11.2.023013
TOPICS: Resonators, Nanoimprint lithography, Nanolithography, Finite element methods, Biosensing, Biological research, Etching, Chemical elements, Electron beam lithography, Polymethylmethacrylate
J. Micro/Nanolith. MEMS MOEMS 11(2), 023014 (20 June 2012) https://doi.org/10.1117/1.JMM.11.2.023014
TOPICS: Microlens array, Microlens, Glasses, Laser ablation, Laser applications, Soda-lime glass, Polymers, Confocal microscopy, Aluminum, Infrared lasers
Errata
J. Micro/Nanolith. MEMS MOEMS 11(2), 029801 (29 June 2012) https://doi.org/10.1117/1.JMM.11.2.029801
TOPICS: Stochastic processes, Systems modeling, Lithography, 3D modeling, Diffusion, Point spread functions, Roads, Convolution
J. Micro/Nanolith. MEMS MOEMS 11(2), 029802 (26 June 2012) https://doi.org/10.1117/1.JMM.11.2.029802
TOPICS: Tin, Plasma, Extreme ultraviolet, Ultraviolet radiation, Spectroscopy, Applied mathematics, Mathematical modeling
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